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VACUUM ›› 2021, Vol. 58 ›› Issue (1): 67-71.doi: 10.13385/j.cnki.vacuum.2021.01.14

• Thin Film • Previous Articles     Next Articles

Thickness Uniformity of Anti-Seizing Coating for Fasteners Prepared by Magnetron Sputtering

WANG Kun1,2, WANG Shi-qing1, LI Jian2, DAN Min1, CHEN Lun-jiang1   

  1. 1. Southwestern Institute of Physics, Chengdu 610041, China;
    2. Neijiang Normal University, Neijiang 641100, China
  • Received:2020-01-20 Online:2021-01-25 Published:2021-01-26

Abstract: To study the uniformity of the anti-seizing coating on the surface of the nuts and bolts of the supporting devices for the magnetic confinement fusion devices, copper films were prepared on the inner and outer wall of the cylindrical device by magnetron sputtering technology. The thickness of the films was measured by the step meter. A rectangular copper block was used as the magnetron sputtering target. The single rotation and revolution plus rotation were used to deposit copper films. The film thickness distribution on the inner wall and the outer wall of the cylindrical devices was analyzed. The results show that the uniformity of the films prepared by revolution plus rotation is better than that by single rotation. The thickness of the films increases with the decrease of the pore(tube) size.

Key words: magnetron sputtering, nuclear fusion, uniformity, anti-seizing, tube inner wall, tube outer wall

CLC Number: 

  • O539
[1] 程西云, 蒋松, 韦云隆. 一种新的咬死失效理论模型—高温熔焊模型[J]. 农业机械学报, 2000, 31(6): 107-110.
[2] 潘泽宇. 热紧螺栓防咬死技术研究[D]. 哈尔滨: 哈尔滨工业大学, 2017.
[3] Wesson J.Tokamak[M]. Clarendon, Oxford, 2004.
[4] 于贺, 王涛, 吴志明, 等. 公-自转磁控溅射镀膜系统薄膜沉积均匀性的研究[J]. 真空科学与技术学报, 2010, 30(2): 149-153.
[5] 邱清泉, 励庆孚, 苏静静, 等. 工作参数对平面磁控溅射系统沉积速率的影响[J]. 真空科学与技术学报, 2009, 29: 46-50.
[6] 王涛, 于贺, 吴志明, 等. 多工位磁控溅射镀膜系统膜厚均匀性的研究[J]. 仪器仪表学报, 2010, 31(1): 218-222.
[7] 范正修, 薛松生, 何朝玲. 磁控溅射薄膜的厚度分布[J]. 应用科学学报, 1993, 11(2): 136-140.
[8] 温培刚, 颜悦, 张官理, 等. 磁控溅射沉积工艺条件对薄膜厚度均匀性的影响[J]. 航空材料学报, 2007, 27(3): 66-68.
[9] SHON C H, LEE J K.Modeling of magnetron sputtering plasmas[J]. Applied Surface Science, 2002, 192: 258-269.
[10] 徐均琪, 易红伟, 蔡长龙, 等. 磁控溅射膜厚均匀性与靶-基距关系的研究[J]. 真空, 2004, 41(2): 25-28.
[11] 韩雷刚, 杨传仁. 多工位平面磁控溅射镀膜装置及膜厚均匀性研究[D]. 成都: 电子科技大学, 2004: 17-41.
[12] 宋建全, 刘正堂, 于忠奇, 等. 平面磁控溅射薄膜厚度分布模拟[J]. 机械科学与技术, 2001, 20(6): 884-885.
[13] SHON C H, LEE J K, LEE H J.Velocity distributions in magnetron sputter[J]. IEEE Transactions of plasm a science, 1998, 26(6): 1635-1644.
[14] Fan Q H, Zhou L Q.A cross-corner effect in a rectangular sputtering magnetron[J]. J Phys D: Appl Phys, 2003, 36: 244-251.
[15] 刘翔宇, 赵来, 许生, 等. 磁控溅射镀膜设备中靶的优化设计[J]. 真空, 2003, 40(4): 16-22.
[16] 惠迎雪, 杭凌侠, 徐均琪, 等. 不同磁控溅射模式膜厚均匀性研究[J]. 西安工业学院学报, 2003, 23(1): 32-36.
[17] 胡作启, 李佐宜, 缪向水, 等. 磁控溅射薄膜的厚度均匀性理论研究[J]. 华中理工大学学报, 1996, 24(1): 89-92.
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