VACUUM ›› 2021, Vol. 58 ›› Issue (6): 38-42.doi: 10.13385/j.cnki.vacuum.2021.06.07
• Thin Film • Previous Articles Next Articles
SONG Guang-hui, LI Wen-long, WANG Yin-he, HU Wen-wen, YAO Chun-long, LIU Hai-tao
CLC Number:
| [1] 蒲玲琳, 林大伟, 李斌成. 深紫外宽入射角范围增透膜设计与制备[J]. 光电工程, 2012, 39(5): 13-17. [2] 李明宇, 顾培夫. 近紫外区宽角度消偏振平板分光镜[J]. 光子学报, 2003, 32(10): 1231-1233. [3] 钟迪生. 真空镀膜[M]. 沈阳: 辽宁大学出版社, 2001: 216-221, 245-252. [4] TODOROVA Z, DONKOV N, RISTIC′Z, et al. Elecrical and optical characteristics of Ta2O5 thin films deposited by electron-beam vapor deposition[J]. Plasma Processes and Polymers, 2006, 2(3): 174-178. [5] 张光勇, 薛亦渝, 郭靖涛, 等. 电子束蒸发沉积Ta2O5光学薄膜的研究[J]. 压电与声光, 2008, 30(1): 12-15. [6] 王宁, 邵建达, 易葵, 等. SiO2材料蒸发特性对膜厚均匀性的影响[J]. 中国激光, 2010, 37(8): 2051-2056. [7] 唐晋发, 顾培夫, 刘旭, 等. 现代光学薄膜技术[M]. 杭州: 浙江大学出版社, 2006: 109-112, 271-275. [8] 聂明局, 刘德明, 胡必春. 薄膜偏振分光镜的优化设计与实验[J]. 红外与激光工程, 2007, 36(6): 899-901. [9] 付秀华, 张于帅. 智能眼镜影响系统宽光谱广角度分光膜的研制[J]. 光子学报, 2015, 44(3): 7-11. [10] 李春, 金春水, 靳京城, 等. 193nm P偏振光大角度减反射膜的实现[J]. 中国激光, 2013, 40(9): 152-156. [11] 艾万君, 熊胜明. 3.6m大口径镀膜机膜厚均匀性分析[J]. 光电工程, 2011, 38(11): 73-78. [12] 郭春, 孔明东, 柳存定, 等. 平面行星系统修正挡板校正膜厚均匀性[J]. 光学学报, 2013, 33(2): 284-288. [13] 朱元强. 行星夹具膜厚均匀性分析[J]. 真空, 2010, 47(5): 57-59. [14] 李正中. 薄膜光学与镀膜技术第二版[M]. 台湾: 艺轩图书出版社, 2020: 336-338. [15] 付秀华, 赵迪, 卢成, 等. 单一蒸发源膜厚分布的均匀性[J]. 光学学报, 2019, 39(12): 417-421. |
| [1] | FU Xue-cheng, XU Jin-bin, WU Li-ying, HUANG Sheng-li, WANG Ying. Study on Uniformity of Inclined Magnetron Sputtering with Small Circular Plane Target [J]. VACUUM, 2021, 58(4): 1-5. |
| [2] | XIE Yong-qiang, JIN Li-yan, YANG Xiao-dong, WANG Cheng-jun, XIA Dan, SU Chun. Finite Elements Analysis and Optimal Design for the Temperature Field of Vacuum Brazing Furnace [J]. VACUUM, 2021, 58(4): 58-62. |
| [3] | LIAO Rong, CUI Ji-yao, DONG Jing-shang, CHEN Dong, HE Wei-jun. Effect of CF4 Flow Rate and RF Power on Reactive Ion Etched Silicon Based Materials [J]. VACUUM, 2021, 58(4): 93-97. |
| [4] | ZHOU Mei-li, SHI Chang-yong, CHEN Qing. Study on DLC Coating Uniformity in the Tube Inner Wall Through Microwave Surface Wave Plasma Deposition [J]. VACUUM, 2021, 58(3): 39-44. |
| [5] | WANG Kun, WANG Shi-qing, LI Jian, DAN Min, CHEN Lun-jiang. Thickness Uniformity of Anti-Seizing Coating for Fasteners Prepared by Magnetron Sputtering [J]. VACUUM, 2021, 58(1): 67-71. |
| [6] | ZHANG Tian-yi, Yang Zhi-hao, LIU Yun-hui, MA Yu-tian, WANG Bo. Effect of Structure and Material of Narrow-Electrode with Quartz Plate Interlayer on DC Plasma Discharge [J]. VACUUM, 2020, 57(5): 61-65. |
|
||