欢迎访问沈阳真空杂志社 Email Alert    RSS服务

VACUUM ›› 2021, Vol. 58 ›› Issue (4): 1-5.doi: 10.13385/j.cnki.vacuum.2021.04.01

• Thin Film •     Next Articles

Study on Uniformity of Inclined Magnetron Sputtering with Small Circular Plane Target

FU Xue-cheng, XU Jin-bin, WU Li-ying, HUANG Sheng-li, WANG Ying   

  1. Advanced Electronics Materials and Devices,Shanghai Jiao Tong University,Shanghai 200240,China
  • Received:2020-06-02 Online:2021-07-25 Published:2021-08-05

Abstract: Based on the actual situation of the inclined magnetron sputtering with the circular plane target, the mathematical model is established according to the characteristics of the angle between the annular etching groove of the target and the horizontal workpiece table. Matlab software is used to simulate and study the influence of different angle on the film thickness distribution when the target and workpiece table are facing each other and the height is fixed. We found that the film thickness increases first and then decreases in the horizontal distance between the worktable and the target. When the target angle is appropriate, the film deposition rate changesapproximately in a straight line within the fixed area of the worktable. We simulated the uniformity on the 4-inch substrate according to the actual characteristics of thedecreasing distribution of the film thickness in the horizontal plane of the worktable. According to the results of theoretical simulation,tantalum nitride films with nonuniformity less than 0.6% were prepared on a 4-inch substrate, which verified the correctness of the mathematical model. The reason why the experimental results are better thanthat of the simulation is explained. This work provides a reference for the design and manufacture of magnetron sputtering coating equipment.

Key words: circular plane target, magnetron sputtering, inclined sputtering, mathematical model, high uniformity

CLC Number: 

  • TB43
[1] 贾嘉. 溅射法制备纳米薄膜材料及进展[J]. 半导体技术, 2004(7): 71-74.
[2] 张继成, 吴卫东, 许华, 等. 磁控溅射技术新进展及应用[J]. 材料导报, 2004(4): 60-63.
[3] 杨武保. 磁控溅射镀膜技术最新进展及发展趋势预测[J]. 石油机械, 2005, 33(6): 73-76.
[4] 王雪敏, 曾小勤, 吴国松, 等. 磁控溅射在镁合金表面处理中的应用[J]. 铸造技术, 2006(4): 111-114.
[5] 王效坤, 房伟华, 刘飞. 磁控溅射法制备的MoO薄膜材料特性[J]. 液晶与显示, 2020, 35(3): 211-218.
[6] 付学成, 王英, 沈赟靓, 等. 负偏压功率对溅射沉积钛、铜薄膜电阻的影响[J]. 真空科学与技术学报, 2018, 38(11): 62-66.
[7] 付学成, 李金华, 谢建生, 等. 钽掺杂对二氧化钒多晶薄膜相变特性的影响[J]. 红外技术, 2010(3): 53-56.
[8] MU E, WU Z H, WU Z M, et al.A Novel Self-Powering Ultrathin TEG Device Based on Micro/nano Emitter for Radiative Cooling[J]. Nano Energy, 2019, 55: 494-500.
[9] 李钦虎, 王军. 磁控反应溅射沉积CrN薄膜的抗氧化性研究[J]. 表面技术, 2005, 34(6): 40-41,44.
[10] VASCONCELLOS M A Z, HINRICHS R, ANDRADE A M H D, et al. Phase characterization of iron-nitride formed by reactive pulsed magnetron sputtering[J]. Surface and Coatings Technology, 2020, 392: 125753.
[11] LIU Y, CHEN J, PENG L M, et al.Improved optical properties of switchable mirrors based on Pd/Mg-TiO2 films fabricated by magnetron sputtering[J]. Materials & Design, 2018, 144: 256-262.
[12] FU C L, YANG C R, HAN L G, et al.The thickness uniformity of films deposited by magnetron sputtering with rotation and revolution[J]. Surface and Coatings Technology, 2006, 200(12-13): 3687-3689.
[13] FAN Q H, CHEN X H, ZHANG Y.Computer simulation of film thickness distribution in symmetrical magnet magnetron sputtering[J]. Vacuum, 1995, 46(3): 229-232.
[14] 黄士勇, 曲凤钦. 用Monte—Carlo法模拟大型磁控溅射器的膜厚分布[J]. 真空电子技术, 1999(5): 38-42.
[15] 孟宪权, 任大志. 环形磁控溅射成膜生长速率及厚度均匀性研究[J]. 武汉大学学报: 自然科学版, 1995(3): 351-356.
[16] 徐均琪, 易红伟, 蔡长龙, 等. 磁控溅射膜厚均匀性与靶—基距关系的研究[J]. 真空, 2004, 41(2): 25-28.
[17] 陈倪娇. 圆形靶磁控溅射均匀性控制及其对沉积薄膜质量影响[D]. 哈尔滨: 哈尔滨工业大学, 2010.
[18] 张以忱, 高士铁, 陈旺. 小圆平面靶磁控溅射镀膜均匀性研究[J]. 真空, 2010, 47(2): 28-33.
[19] 侯丽媛. 双靶共沉积镀制复合膜的成分均匀性研究[D]. 沈阳: 东北大学, 2010.
[20] 张以忱. 真空镀膜技术[M]. 北京: 冶金工业出版社, 2009: 116-119.
[21] 张以忱. 真空镀膜技术[M]. 北京: 冶金工业出版社, 2009: 88.
[22] 李欣年, 江炳尧. 蒙特卡罗模拟单元素靶的溅射产额角分布[J]. 上海大学学报(自然科学版), 1996(1): 12-17.
[1] ZHANG Jian, NIU Xia-bin, LI Jian-hao, QI Zhen-hua. Effect of RF Power and Sputtering Pressure on Al Film Sputtered on Polythylene Terephthalate Substrates [J]. VACUUM, 2021, 58(4): 21-24.
[2] YU Hua-jun, ZHAO Xi-jun, WU Rui-jun. Solutions for Asymmetrical Target Erosion Due to Cross-Cathode Effect [J]. VACUUM, 2021, 58(3): 51-54.
[3] YANG Zi-shu, DUAN Ping, DENG Jin-xiang, ZHANG Xiao-xia, ZHANG Jie, YANG Qian-qian. Preparation and Study of Mg-doped β-Ga2O3 Thin Films with Different Content [J]. VACUUM, 2021, 58(3): 30-34.
[4] CHEN Zhi-tao. Development of Coating Equipment for Four Meter Trough Vacuum Solar Collector [J]. VACUUM, 2021, 58(2): 20-26.
[5] WU Jian-kun, LI Zhao-guo, PENG Li-ping, YI yong, ZHANG Ji-cheng. Effect of Nitrogen Ratio on Structure and Color of ZrN thin Films [J]. VACUUM, 2021, 58(1): 57-62.
[6] WANG Kun, WANG Shi-qing, LI Jian, DAN Min, CHEN Lun-jiang. Thickness Uniformity of Anti-Seizing Coating for Fasteners Prepared by Magnetron Sputtering [J]. VACUUM, 2021, 58(1): 67-71.
[7] DAI Yong-xi, YANG Qian-qian, DENG Jin-xiang, KONG le, LIU Hong-mei, YANG Kai-hua, WANG Ji-you. Preparation and Study of ZTO Thin Film Doped with Different Si Content [J]. VACUUM, 2020, 57(6): 23-26.
[8] WEI Xian-lu, GONG Chen-yang, XIAO Jian-rong. Structure and Optical Properties of MoS2 Thin Films Prepared by RF Reactive Magnetron Sputtering [J]. VACUUM, 2020, 57(5): 11-13.
[9] WANG Zhao-yong, LI Wei, WANG Kai-hong, LI Zong-ze, LIU Zhi-qing, YU Chen-sheng, WANG Xin-lian, WANG Xiao-ni, WU Hao, MA Pei-fang. Study on Depositing Rate of the Anatase TiO2Thin Film Preparated by the Direct Current Magnetron Sputtering Technique, Its Application in the Fabricating of Multilayer Films [J]. VACUUM, 2020, 57(5): 19-23.
[10] WANG Xiao-ming, E Dong-mei, WU Jun-sheng, ZHANG Xu-yue, ZHOU Yan-wen. Simulation of MagnetronSputtering Enhancement Based on Plasma [J]. VACUUM, 2020, 57(3): 5-6.
[11] ZHANG Qing-fang, YI Yong, LUO Jiang-shan. Effect of Sputtering Power on Microstructure of Er Thin Films Deposited by Magnetron Sputtering [J]. VACUUM, 2020, 57(3): 17-20.
[12] WU Hou-pu, TIAN Qin-wen, TIAN Xiu-bo, GONG Chun-zhi. Development and Discharge Behavior of Novel Double Bipolar Pulse High Power Impulse Magnetron Sputtering System [J]. VACUUM, 2019, 56(6): 1-6.
[13] LIAO Rong, DENG Yong-jian, WANG Jia-ju, ZHAO Fei-lan, ZHENG Ruo-qian, LIU Hui-jun, KE Jia-chong. Preparation and Properties of High Dielectric Hafnium Oxide Thin Film [J]. VACUUM, 2019, 56(5): 52-55.
[14] WU Shi-cai, SHANG Xin-de. Application of Flexible Coating Materials in Circuit Board Industry [J]. VACUUM, 2019, 56(5): 65-68.
[15] LUO Jun-yao, LIU Guang-zhuang, YANG Zhao, LI Bao-chang, TA Shi-wo. Study on Magnetron Sputtering and Wet Etching Technology of Chromium Silicon Thin Film Resistive Layer [J]. VACUUM, 2019, 56(5): 61-64.
Viewed
Full text


Abstract

Cited
  Shared   
  Discussed   
[1] LI De-tian, CHENG Yong-jun, ZHANG Hu-zhong, SUN Wen-jun, WANG Yong-jun, SUN Jian, LI Gang, . Preparations and applications of carbon nanotube field emitters[J]. VACUUM, 2018, 55(5): 1 -9 .
[2] ZHOU Bin-bin, ZHANG jian, HE Jian-feng, DONG Chang-kun. Carbon nanotube field emission cathode based on direct growth technique[J]. VACUUM, 2018, 55(5): 10 -14 .
[3] LI Zhi-sheng. Development of ultra large shielded door for infrared calibration in simulated space environment[J]. VACUUM, 2018, 55(5): 66 -70 .
[4] ZHENG Lie, LI Hong. Design of 200kV/2mA continuous adjustable DC high voltage generator[J]. VACUUM, 2018, 55(6): 10 -13 .
[5] CHAI Xiao-tong, WANG Liang, WANG Yong-qing, LIU Ming-kun, LIU Xing-zhou, GAN Shu-yi. Operating parameter data acquisition system for single vacuum pump based on STM32F103 microcomputer[J]. VACUUM, 2018, 55(5): 15 -18 .
[6] SUN Li-zhi, YAN Rong-xin, LI Tian-ye, JIA Rui-jin, LI Zheng, SUN Li-chen, WANG Yong, WANG Jian, . Research on distributing law of Xenon in big accumulation chamber[J]. VACUUM, 2018, 55(5): 38 -41 .
[7] HUANG Si, WANG Xue-qian, MO Yu-shi, ZHANG Zhan-fa, YING Bing. Experimental study on similarity law of liquid ring compressor performances[J]. VACUUM, 2018, 55(5): 42 -45 .
[8] JI Ming, SUN Liang, YANG Min-bo. Design of automatic sealing and locking scheme for lunar sample[J]. VACUUM, 2018, 55(6): 24 -27 .
[9] LI Min-jiu, XIONG Tao, JIANG Ya-lan, HE Yan-bin, CHEN Qing-chuan. 20kV high voltage based on double transistor forward converter pulse power supply for metal deburring[J]. VACUUM, 2018, 55(5): 19 -24 .
[10] LIU Yan-wen, MENG Xian-zhan, TIAN Hong, LI Fen, SHI Wen-qi, ZHU Hong, GU Bing. Test of ultra high vacuum in space traveling-wave tube[J]. VACUUM, 2018, 55(5): 25 -28 .
辽ICP备06004570号-4
Copyright © VACUUM, All Rights Reserved.
Tel: （024）24134406 24110136 24121929　Fax: （024） 24121929　E-mail: zkzk1964@126.com
Powered by Beijing Magtech Co. Ltd