VACUUM ›› 2024, Vol. 61 ›› Issue (4): 102-104.doi: 10.13385/j.cnki.vacuum.2024.04.19
• Lectures on Vacuum Technology and Its Application • Previous Articles Next Articles
ZHANG Yi-chen
CLC Number: O484;TB43
[1] | BAI Hao-yu, YAO Chun-long, DONG Ming, QIN Rui, BAI Yong-hao, WANG Yi-nan. Development of Ultra-High Steepness Edge Long Wave Pass Raman Filter [J]. VACUUM, 2024, 61(4): 12-16. |
[2] | LI Rui-dong, JIN Da-li, ZHANG Mei-dong, YU Li-ping, WANG Jian-wei. Effect of Different Experimental Conditions on Charge Carrier Mobility of α-Se Films [J]. VACUUM, 2024, 61(4): 17-21. |
[3] | LI Can-min, DONG Zhong-lin, XIA Zheng-wei, ZHANG Xin-feng, WEI Rong-hua. Microstructure and Properties of TiCr-based Nanocomposite Coatings by Plasma Enhanced Magnetron Sputtering [J]. VACUUM, 2024, 61(2): 10-15. |
[4] | . [J]. VACUUM, 2024, 61(2): 86-88. |
[5] | . [J]. VACUUM, 2024, 61(1): 87-88. |
[6] | WU Xiao-hu, HU Shu-jie, SUN En-ze, ZHANG Xin, ZHAO Qi. Performance Regulation Approach of Fluorinated Amorphous Carbon Film for Large-space Building [J]. VACUUM, 2023, 60(6): 42-46. |
[7] | ZHANG Yi-chen. No. 22:Chemical Vapor Deposition Technology [J]. VACUUM, 2023, 60(6): 87-88. |
[8] | . [J]. VACUUM, 2023, 60(5): 102-104. |
[9] | . [J]. VACUUM, 2023, 60(4): 85-88. |
[10] | YU Kang-yuan, HE Yu-dan, YANG Bo, LUO Jiang-shan. Effect of Sputtering Voltage on Microstructure and Properties of Cu Foils Deposited by High Power Impulse Magnetron Sputtering [J]. VACUUM, 2023, 60(3): 1-4. |
[11] | ZHU Jian-hua, PAN Jing, YUE Jian-ming, HAO Li-ping, ZHI Peng-wei, JIA Zhe. Structure and Luminescence Properties of Zn1-xSbxO Films Grown at Different Temperatures [J]. VACUUM, 2023, 60(3): 18-23. |
[12] | XIANG Yu-chun, ZHU Jian-lei, YUAN Ya. Effect of Oxygen Pressure on the Properties of CuO Films Grown by Pulse Laser Deposition [J]. VACUUM, 2023, 60(3): 42-45. |
[13] | . [J]. VACUUM, 2023, 60(3): 86-88. |
[14] | ZHANG Han-yan, ZHENG Dan-xu, SHEN Yi, CHEN Yu-yun. Research of Insulation of Silicon Oxide Film Produced by Medium Frequency Magnetron Sputtering [J]. VACUUM, 2023, 60(2): 34-38. |
[15] | . [J]. VACUUM, 2023, 60(2): 86-88. |
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