VACUUM ›› 2025, Vol. 62 ›› Issue (3): 94-96.doi: 10.13385/j.cnki.vacuum.2025.03.17
• Lectures on Vacuum Technology and Its Application • Previous Articles Next Articles
CLC Number: O484;TB43
[1] | OGATA Kiyoshi, SUZUKI Yasuo, BI Tingting. Development and Application of Intelligent DLC Thin Films by PIAD Technology——Study on Application to Metal Separators for Fuel Cells [J]. VACUUM, 2025, 62(2): 68-76. |
[2] | LU Meijie, ZHENG Zihong, GAO Weinan, ZHENG Haozhi, LIU Gongwen, LIAN Songyou, XU Rongwang, WANG Jiangyong. Development of Quantitative Analysis Software for Film Depth Profiling [J]. VACUUM, 2025, 62(1): 37-43. |
[3] | . [J]. VACUUM, 2025, 62(1): 86-88. |
[4] | CHEN Yu-yun, WANG Xiao-xu, CHEN Yuan-ming, SHEN Yi, HUANG Rui. Study of Electrical Insulation Property of Magnetron Sputtered Silicon Oxide and Silicon Oxide/Silicon Nitride/Silicon Oxide Films [J]. VACUUM, 2024, 61(6): 15-20. |
[5] | . [J]. VACUUM, 2024, 61(6): 85-88. |
[6] | BAI Hao-yu, YAO Chun-long, DONG Ming, QIN Rui, BAI Yong-hao, WANG Yi-nan. Development of Ultra-High Steepness Edge Long Wave Pass Raman Filter [J]. VACUUM, 2024, 61(4): 12-16. |
[7] | LI Rui-dong, JIN Da-li, ZHANG Mei-dong, YU Li-ping, WANG Jian-wei. Effect of Different Experimental Conditions on Charge Carrier Mobility of α-Se Films [J]. VACUUM, 2024, 61(4): 17-21. |
[8] | ZHANG Yi-chen. No. 22:Chemical Vapor Deposition Technology [J]. VACUUM, 2024, 61(4): 102-104. |
[9] | LI Can-min, DONG Zhong-lin, XIA Zheng-wei, ZHANG Xin-feng, WEI Rong-hua. Microstructure and Properties of TiCr-based Nanocomposite Coatings by Plasma Enhanced Magnetron Sputtering [J]. VACUUM, 2024, 61(2): 10-15. |
[10] | . [J]. VACUUM, 2024, 61(2): 86-88. |
[11] | . [J]. VACUUM, 2024, 61(1): 87-88. |
[12] | WU Xiao-hu, HU Shu-jie, SUN En-ze, ZHANG Xin, ZHAO Qi. Performance Regulation Approach of Fluorinated Amorphous Carbon Film for Large-space Building [J]. VACUUM, 2023, 60(6): 42-46. |
[13] | ZHANG Yi-chen. No. 22:Chemical Vapor Deposition Technology [J]. VACUUM, 2023, 60(6): 87-88. |
[14] | . [J]. VACUUM, 2023, 60(5): 102-104. |
[15] | . [J]. VACUUM, 2023, 60(4): 85-88. |
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