脉冲阴极弧等离子体及有关特性研究

doi:10.13385/j.cnki.vacuum.2024.01.01

摘要/Abstract

摘要： 阴极弧（Cathodic Arcs）是目前多种薄膜及涂层制备工艺的重要物质来源。从阴极表面起弧形成阴极斑点、产生等离子体（相变）、等离子体在真空室中的扩展（输运）,到最终在施加偏压的基体上沉积、凝聚形成涂层或薄膜,这一系列环节包含着复杂的物理过程。对这些过程及相关机制的深入分析与认识,无疑会对涂层制备工艺起到重要的理论指导作用。本文简要回顾了人类对阴极弧有关的放电现象的认识过程以及相关涂层的发展历史。对阴极放电机制以及与涂层工艺密切相关的等离子体行为,诸如脉冲阴极弧等离子体速度、鞘层、斜入射与附着系数等问题进行了探讨与实验结果的汇总。旨在为读者对阴极弧及其涂层工艺提供感性认识,为指导科研生产实践服务。

关键词: 阴极弧, 脉冲阴极弧等离子体, 等离子体鞘层, 斜入射, 附着系数

Abstract: Cathodic arc is an important material source for a variety of film and coating preparation processes. From the cathode spot on the cathode surface, the generation (phase transition) and expansion (transport) of plasma in the vacuum chamber, to the final deposition on the biased substrate to form a coating or film, this series of links contain complex physical processes. Deeply analyzing and understanding of the processes and related mechanisms will undoubtedly play an important role in guiding the coating preparation process. This paper briefly introduces the process of the discharge phenomena and the history of the related coatings development. Then the cathode discharge mechanism and the plasma behaviors closely related to the coating process, such as plasma velocity, sheath, oblique incidence and attachment coefficient are discussed. The aim is to help readers form a clear physical image and context for the process of cathode arc and its coating formation, and serve to guide the practice of scientific research and production.

Key words: cathode arc, pulsed cathodic arc plasma, plasma sheath, oblique incidence, attachment coefficient

中图分类号: O539;TB43

武洪臣, 杨丽媛. 脉冲阴极弧等离子体及有关特性研究[J]. 真空, 2024, 61(1): 1-9.

WU Hong-chen, YANG Li-yuan. Research on Pulsed Cathodic Arc Plasma and the Related Characteristics[J]. VACUUM, 2024, 61(1): 1-9.

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