工作气压对HiPIMS放电特性与Cr涂层结构性能影响研究*

doi:10.13385/j.cnki.vacuum.2026.05.02

真空 ›› 2026, Vol. 63 ›› Issue (5): 12-20.doi: 10.13385/j.cnki.vacuum.2026.05.02

工作气压对HiPIMS放电特性与Cr涂层结构性能影响研究^*

田媛媛¹, 朱洪波², 牟清², 胡天时¹, 田修波^1,*, 耿慧远^1,*, 巩春志¹, 张辉¹

1.哈尔滨工业大学材料结构精密焊接与连接全国重点实验室,黑龙江哈尔滨 150001;
2.重庆长安望江工业集团有限公司,重庆 401133

收稿日期:2026-01-15 出版日期:2026-09-25 发布日期:2026-09-28
通讯作者: 田修波,教授;耿慧远,副教授。
作者简介:田媛媛（2001-）,女,山东烟台人,硕士研究生。
基金资助:
*国家自然科学基金资助项目（U2241233.12075071）

Discharge Behavior and Coating Structure-Property Relationship of Cr Target HiPIMS under Low Working Pressure

TIAN Yuanyuan¹, ZHU Hongbo², MU Qing², HU Tianshi¹, TIAN Xiubo^1,*, GENG Huiyuan^1,*, GONG Chunzhi¹, ZHANG Hui¹

1. State Key Laboratory of Precision Welding ＆ Joining for Materials and Structures, Harbin Institute of Technology, Harbin,150001, China;
2. Chongqing Chang'an Wangjiang Industrial Group Co., Ltd., Chongqing 401133, China

Received:2026-01-15 Online:2026-09-25 Published:2026-09-28

摘要/Abstract

摘要： 为了改善低气压下靶前等离子体的空间分布,揭示工作气压对Cr靶HiPIMS放电与涂层性能的影响规律,本文调整电磁场结构,在靶前引入辅助阳极,成功实现在低工作气压（0.1 Pa）下稳定放电,系统研究了0.1~1.2 Pa范围内工作气压对放电特性以及涂层组织结构和性能的影响规律。采用复合直流高功率电源,保持脉冲电压、脉冲宽度与总功率恒定,分别制备了四组Cr涂层,通过对涂层截面形貌、相结构、表面粗糙度及力学性能进行分析,随着工作气压从1.2 Pa下降到0.1 Pa,脉冲放电过程由气体放电主导向金属放电主导过渡,涂层沉积速率从2.39 μm/h降低到1.53 μm/h。由于气体分子的遮挡效果减弱,等离子体能量提高,入射离子能量提高,导致晶粒尺寸逐渐减小,在0.1 Pa时降低到26.82 nm,同时表面粗糙度从2.45 nm降低到1.27 nm。工作气压的降低可显著影响涂层的界面失效行为,涂层-基体结合力从1.2 Pa时的3.8 N提高到0.1 Pa时的6.8 N,这与真空度升高带来的涂层纯度提高有关。低气压（<0.2 Pa）有利于获得表面更平整、致密且结合力更高的Cr涂层;较高气压（≈1.2 Pa）则获得更高硬度/模量,但粗糙度与界面完整性相对下降。

关键词: 工作气压, 辅助阳极, HiPIMS, Cr涂层, 放电特性

Abstract: This work aims to improve the spatial distribution of plasma in front of the target under low working pressure and to clarify the influence of working pressure on the discharge characteristics and coating properties of Cr target HiPIMS. By adjusting the electromagnetic field configuration and introducing an auxiliary anode in front of the target, stable discharge was successfully achieved at low working pressure of 0.1 Pa. The effects of working pressure in the range of 0.1-1.2 Pa on discharge characteristics, coating microstructure, and properties were systematically investigated. Four groups of Cr coatings were deposited using a composite DC high-power supply while keeping pulse voltage, pulse width, and total power constant. The cross-sectional morphology, phase structure, surface roughness, and mechanical properties of the coatings were analyzed. As the working pressure decreased from 1.2 to 0.1 Pa, the pulse discharge process transitioned from gas-dominated to metal-dominated. The deposition rate decreased from 2.39 to 1.53 μm/h. With the weakening of gas molecular shielding and the increase in plasma energy, higher incident ion energy led to grain refinement, reducing the grain size to 26.82 nm at 0.1 Pa. Meanwhile, the surface roughness decreased from 2.45 to 1.27 nm. Lowering the working pressure also significantly influenced interfacial failure behavior, as the critical load for coating-substrate adhesion (Lc2) increased from 3.8 N at 1.2 Pa to 6.8 N at 0.1 Pa, which is attributed to the higher coating purity under high vacuum. Low working pressure (<0.2 Pa) favors the formation of smoother, denser Cr coatings with stronger adhesion, while higher pressure (≈1.2 Pa) yields coatings with higher hardness and modulus but increased roughness and reduced interfacial integrity.

Key words: working pressure, auxiliary anode, HiPIMS, Cr coating, discharge characteristics

中图分类号: TB43

田媛媛, 朱洪波, 牟清, 胡天时, 田修波, 耿慧远, 巩春志, 张辉. 工作气压对HiPIMS放电特性与Cr涂层结构性能影响研究^*[J]. 真空, 2026, 63(5): 12-20.

TIAN Yuanyuan, ZHU Hongbo, MU Qing, HU Tianshi, TIAN Xiubo, GENG Huiyuan, GONG Chunzhi, ZHANG Hui. Discharge Behavior and Coating Structure-Property Relationship of Cr Target HiPIMS under Low Working Pressure[J]. VACUUM, 2026, 63(5): 12-20.

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工作气压对HiPIMS放电特性与Cr涂层结构性能影响研究^*

Discharge Behavior and Coating Structure-Property Relationship of Cr Target HiPIMS under Low Working Pressure

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