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VACUUM ›› 2021, Vol. 58 ›› Issue (3): 45-50.doi: 10.13385/j.cnki.vacuum.2021.03.09

• Thin Film • Previous Articles     Next Articles

Effect of Vacuum Heat Treatment on Structure and Photoelectric Properties of AZO Film

ZHANG Xin-hui1, LI Qing-xiao2   

  1. 1. School of Energy and Building Enviroment Engineering,University of Urban Construction,Pingdingshan 467036,China;
    2. School of Materials and Chemical Engineering,University of Urban Construction,Pingdingshan 467036,China
  • Received:2020-06-18 Online:2021-05-25 Published:2021-06-01

Abstract: AZO thin films were respectively deposited on the preheated glass substrate and room temperature by DC magnetron sputtering, and AZO films prepared at room temperature were annealed in vacuum. X-ray diffractometer, ultraviolet-visible spectrometer, four-point probes and Hall tester were used to character the prepared samples. The effects of two heat treatment methods, i.e.substrate pre-heating and vacuum annealing, on the structure and photoelectric properties of AZO thin films were comparatively studied. The results show that AZO thin films prepared under substrate preheating condition effectively inhibit the formation of（101）polycrystalline phase. AZO thin films prepared at room temperature have more（101）polycrystalline phase formation, and after vacuum annealing heat treatment, the（101）polycrystalline phase cannot be well eliminated. AZO thin films with a thickness of 380 nm and a square resistance of 20Ω/□ were prepared under the substrate preheating condition, the average transmittance between 400 nm and 1200 nm wavelength is 81.5%. The vacuum-annealed AZO film with a thickness of 403nm and a square resistance of 33Ω/□ has an average transmittance of 81.9% in the 400-1200nm band.

Key words: AZO thin film, vacuum, heat treatment, sheet resistance, photoelectric properties

CLC Number: 

  • TN304
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