VACUUM ›› 2021, Vol. 58 ›› Issue (6): 48-54.doi: 10.13385/j.cnki.vacuum.2021.06.09
• Thin Film • Previous Articles Next Articles
WEI Yong-qiang
CLC Number:
[1] DAALDER J E.Components of cathode erosion in vacuum arcs[J]. Journal of Physics D: Applied Physics, 1976, 9(16): 2379-2395. [2] DAALDER J E.A cathode spot model and its energy balance for metal vapour arcs[J]. Journal of Physics D: Applied Physics, 1978, 11(12): 1667-1682. [3] UTSUMI T, ENGLISH J H.Study of electrode products emitted by vacuum arcs in form of molten metal particles[J]. Journal of Applied Physics, 1975, 46(1): 126-131. [4] MONTEIRO O R, ANDERS A.Vacuum-arc-generated macroparticles in the nanometer range[J]. IEEE Transactions on Plasma Science, 1999, 27(4): 1030-1033. [5] ZHIRKOV I, POLCIK P, KOLOZSVÁRI S, et al. Macroparticle generation in DC arc discharge from a WC cathode[J]. Journal of Applied Physics, 2017, 121(10): 103305. [6] SHIAO M H, CHANG Z C, SHIEU F S.Characterization and formation mechanism of macroparticles in arc ion-plated CrN thin films[J]. Journal of The Electrochemical Society, 2003, 150(5): 320-324. [7] 魏永强, 魏永辉, 蒋志强, 等. 基体放置状态与脉冲偏压幅值对大颗粒形貌和分布的影响规律[J]. 真空科学与技术学报, 2014, 34(10): 1021-1028. [8] 魏永强, 魏永辉, 蒋志强, 等. 放置方向和沉积时间对 Ti 大颗粒分布状态的影响[J]. 表面技术, 2014, 43(5): 6-10+41. [9] 魏永强, 刘建伟, 文振华, 等. 脉冲偏压占空比和放置状态对大颗粒分布规律的影响[J]. 热加工工艺, 2015, 44(4): 134-137. [10] 魏永强, 贾爱芹, 蒋志强, 等. 靶基间距对电弧离子镀中大颗粒形貌和分布的影响[J]. 金属热处理, 2014, 39(7): 130-134. [11] BOXMAN R L, GOLDSMITH S.Macroparticle contamination in cathodic arc coatings: generation, transport and control[J]. Surface & Coatings Technology, 1992, 52(1): 39-50. [12] SHALEV S, BOXMAN R L, GOLDSMITH S.Velocities and emission rates of cathode-produced molybdenum macroparticles in a vacuum arc[J]. Journal of Applied Physics, 1985, 58(7): 2503-2507. [13] NITTER T.Levitation of dust in rf and dc glow discharges[J]. Plasma Sources Science and Technology, 1996, 5(1): 93-111. [14] KIMBLIN C W.Erosion and ionization in the cathode spot regions of vacuum arcs[J]. Journal of Applied Physics, 1973, 44(7): 3074-3081. [15] VYSKOČIL J, MUSIL J. Cathodic arc evaporation in thin film technology[J]. Journal of Vacuum Science & Technology A, 1992, 10(4): 1740-1748. [16] BOXMAN R L.Interferometric measurement of electron and vapor densities in a high-current vacuum arc[J]. Journal of Applied Physics, 1974, 45(11): 4835-4846. [17] 黄美东. 脉冲偏压电弧离子镀低温沉积研究 [D]. 大连: 大连理工大学, 2002. [18] BEN-SHALOM A, BOXMAN R L, GOLDSMITH S.Ion current collected at various distances and argon background pressures in a copper vacuum arc[J]. IEEE Transactions on Plasma Science, 1993, 21(5): 435-439. [19] DAVIS W D, MILLER H C.Analysis of the electrode products emitted by dc arcs in a vacuum ambient[J]. Journal of Applied Physics, 1969, 40(5): 2212-2221. [20] ANDERS A.Growth and decay of macroparticles:a feasible approach to clean vacuum arc plasmas?[J]. Journal of Applied Physics, 1997, 82(8): 3679-3688. [21] BOXMAN R L, GOLDSMITH S.The interaction between plasma and macroparticles in a multi-cathode-spot vacuum arc[J]. Journal of Applied Physics, 1981, 52(1): 151-161. [22] TAY B K, ZHAO Z W, CHUA D H C. Review of metal oxide films deposited by filtered cathodic vacuum arc technique[J]. Materials Science and Engineering R, 2006, 52(1-3): 1-48. [23] KUTZNER J, MILLER H C.Integrated ion flux emitted from the cathode spot region of a diffuse vacuum arc[J]. Journal of Physics D: Applied Physics, 1992, 25(4): 686-693. [24] 张克华, 董是元. 钛及钛合金的焊接[M]. 北京: 机械工业出版社, 1985: 1-2. [25] RYSANEK F.Charging of macroparticles ejected from a pulsed vacuum arc[D]. United States Illinois: University of Illinois at Urbana-Champaign, 2007. |
[1] | YANG Tong, YIN Zheng-xin, QIU Ji-er, YANG Sheng-yuan, ZHANG Qing-bo, YU De-ping. Research on the Static and Dynamic Behavior on the Plasma Torch Used for Plasma Atomization [J]. VACUUM, 2021, 58(5): 66-71. |
[2] | FENG Jie, CHENG Rong, ZHAO Yong, WANG Yan-long, WANG Shang-min, ZHANG Hong, JIA Yan-hui. FFT Analysis of Discharge Oscillations of Plasma Contactor [J]. VACUUM, 2021, 58(5): 72-76. |
[3] | TU Jun, SONG Wen-jie, ZHANG Bin, YU De-ping, LI Yi-hong. Experimental Study on the Working Characteristics of Steam Plasma Torch [J]. VACUUM, 2021, 58(4): 87-92. |
[4] | ZHOU Mei-li, SHI Chang-yong, CHEN Qing. Study on DLC Coating Uniformity in the Tube Inner Wall Through Microwave Surface Wave Plasma Deposition [J]. VACUUM, 2021, 58(3): 39-44. |
[5] | WU Yan-chao, LIU Yu-yao, LIU Yang, GAO Sheng-yuan, HUANG Mei-dong. Effects of Modulation Ratio on Mechanical Properties of Cr/TiN Nano-multilayers Prepared by Arc Ion Plating [J]. VACUUM, 2021, 58(2): 10-14. |
[6] | CHAI Hao, JIA Jun-wei, WANG Bin, LI Peng, CUI Shuang, FENG Xu, LI Wei, LIU Zhan, LI Shao-fei, CHEN Quan. Design and Characteristic Study on Compact Microwave ECR Plasma Source [J]. VACUUM, 2021, 58(1): 6-9. |
[7] | WU Ying-tong, LI Xiao-min, BAI Rui, WANG Dong-wei, WANG Yu, HUANG Mei-dong. Effects of Extra Biased Electric Field on Structure and Properties of TiN Films Deposited by Arc Ion Plating [J]. VACUUM, 2021, 58(1): 63-66. |
[8] | YIN Ji-ping, QIAO Hong, LIN Zeng, BA De-chun. Data Processing System of Single Langmuir Probe Based on LabVIEW [J]. VACUUM, 2020, 57(6): 48-53. |
[9] | WANG Fu-zhen. Heat Treatment and Vacuum Coating Towards Integration [J]. VACUUM, 2020, 57(5): 1-6. |
[10] | TAN Fei, LIN Song-sheng, SHI Qian, DAI Ming-jiang, DU Wei, WANG Yun-cheng, LV Liang. Fabrication of NiCrAlY Coating by Arc Ion Plating and Its High Temperature Oxidation Resistance [J]. VACUUM, 2020, 57(5): 7-10. |
[11] | ZHANG Tian-yi, Yang Zhi-hao, LIU Yun-hui, MA Yu-tian, WANG Bo. Effect of Structure and Material of Narrow-Electrode with Quartz Plate Interlayer on DC Plasma Discharge [J]. VACUUM, 2020, 57(5): 61-65. |
[12] | XU Fa-jian, HUANG Zhi-ting, LIU Bao-xin. Design Method and Engineering Application of Liquid Ring Compression System Based on Thermodynamics Theory [J]. VACUUM, 2020, 57(5): 79-84. |
[13] | ZHAO Jie, XV Li, LI Jian, WANG Kun, WANG Shi-qing. Numerical Simulation and Analysis of Discharge Plasma in Hall Thruster [J]. VACUUM, 2020, 57(4): 54-59. |
[14] | WANG Xiao-ming, E Dong-mei, WU Jun-sheng, ZHANG Xu-yue, ZHOU Yan-wen. Simulation of MagnetronSputtering Enhancement Based on Plasma [J]. VACUUM, 2020, 57(3): 5-6. |
[15] | ZHONG Li, SHEN Li-ru, CHEN Mei-yan, LIU Tong, DAN Min, JIN Fan-ya. Study on Tribological Properties of (Ti, Cr) N Films [J]. VACUUM, 2020, 57(2): 27-32. |
|