基于洁净真空的半导体测试设备的研发

doi:10.13385/j.cnki.vacuum.2025.01.10

Abstract

Abstract: The cleanliness of the equipment is extremely important for semiconductor device performance. In the test equipment, the vacuum environment has lower suspended particles and residual gas content, which is closer to the true clean vacuum. The acquisition and maintenance of the clean vacuum is a key technology of semiconductor industry production, involving a variety of techniques. This paper introduces the development process of clean vacuum system technology equipment from the aspects of chamber material selection, chamber design and manufacture, cleaning and testing of internal surfaces, packaging and transshipment. The developed equipment can quickly obtain a working vacuum degree of 1×10^-4 Pa under load, and the residual gas and particle size indicators meet the process requirements.

Key words: clean vacuum, semiconductor, granularity, ultra-high vacuum

CLC Number: TH69

TANG Rong, LU Shaobo, HAN Yongchao. Research and Development of Semiconductor Test Equipment Based on Clean Vacuum[J].VACUUM, 2025, 62(1): 62-66.

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Research and Development of Semiconductor Test Equipment Based on Clean Vacuum

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