溅射离子泵腔体内壁制备NEG薄膜均匀性的研究*

doi:10.13385/j.cnki.vacuum.2026.03.02

摘要/Abstract

摘要： 溅射离子泵（sputter ion pump, SIP）是一种广泛应用于超高真空和极高真空环境中的真空设备,其具有结构简单、使用寿命长、无油、无振动、无噪音等优点。将非蒸散型吸气剂（NEG）材料以泵芯的形式嵌入溅射离子泵中,是提升极限真空度的有效方法。本研究设计了一种新型的嵌入式结构,采用直流磁控溅射方式,利用双同轴圆柱环状磁体靶在溅射离子泵腔体内壁沉积NEG薄膜。该结构一方面可减少腔体内壁材料的放气,另一方面可增强对活性气体的吸附能力,从而提高溅射离子泵的极限真空度。实验选用成分比例一致的钛锆钒合金作为NEG材料,重点研究镀膜过程中薄膜的厚度均匀性,分别考察工作气压与溅射功率对腔体内壁薄膜横向与纵向均匀度的影响。研究结果表明,提高工作气压和溅射功率均可改善薄膜的均匀性,且对纵向均匀度的影响更为显著。同时,靶基距D与基板宽度W的比值β对薄膜均匀度具有显著影响。

关键词: 非蒸散型吸气剂薄膜, 溅射离子泵, 磁控溅射, 膜厚均匀性

Abstract: The sputter ion pump (SIP) is a vacuum device widely used in ultra-high and extreme-high vacuum environments due to its simple structure, long service life, oil-free operation, and vibration-free, noiseless performance. Embedding non-evaporable getter (NEG) materials into the SIP core is an effective approach to enhance its ultimate vacuum level. In this study, a novel embedded structure was developed using direct current magnetron sputtering with dual coaxial cylindrical ring magnet targets to deposit NEG thin films on the inner wall of the SIP chamber. This configuration not only reduces outgassing from the chamber wall but also enhances the adsorption of active gases, thereby improving the ultimate vacuum performance of SIP. A Ti-Zr-V alloy with a fixed composition was selected as the NEG material. The study focuses on the uniformity of film thickness, investigating the effects of working pressure and sputtering power on both lateral and vertical uniformity of the films. Results show that increasing working pressure and sputtering power improves the uniformity, with a more pronounced effect in the vertical direction. Moreover, the ratio between target-substrate distance (D) and substrate width (W), defined as β, significantly influences the uniformity of the deposited film.

Key words: non-evaporable getter (NEG) thin film, sputter ion pump, magnetron sputtering, film thickness uniformity

中图分类号: TB79

朱云鹤, 臧浩天, 郑梦欣, 王晓冬. 溅射离子泵腔体内壁制备NEG薄膜均匀性的研究^*[J]. 真空, 2026, 63(3): 16-22.

ZHU Yunhe, ZANG Haotian, ZHENG Mengxin, WANG Xiaodong. Study on the Uniformity of NEG Thin Film Deposition on the Inner Wall of a Sputter Ion Pump Chamber[J]. VACUUM, 2026, 63(3): 16-22.

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