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VACUUM ›› 2021, Vol. 58 ›› Issue (5): 26-31.doi: 10.13385/j.cnki.vacuum.2021.05.03

• Vacuum Technology Application • Previous Articles     Next Articles

Present Situation and Development of Nano Films Deposited by Molecular Layer Deposition

CHEN QIAN, YANG Li-zhen, LIU Zhong-Wei, ZHANG Hai-bao, CHEN Qiang   

  1. Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China
  • Received:2020-11-05 Online:2021-09-25 Published:2021-09-23

Abstract: With the development of microelectronic technology, lithium-ion batteries and solar cells, especially the need of nano polymer films, are becoming higher and higher. Since the traditional deposition method can not meet the requirements, it is imperative to find a new method to deposit polymer. Molecular layer deposition(MLD) is a technique similar to atomic layer deposition, which can precisely control the thickness, composition, morphology and shape retention of polymer films. Therefore, MLD can be a new method to prepare polymer films. In this paper, the principle and method of MLD, as well as the development and application in the field of thin film preparation are reviewed. Finally, the challenges and prospects of MLD in the future are forecasted.

Key words: molecular layer deposition, principle, thin film, application

CLC Number: 

  • TQ31
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