VACUUM ›› 2026, Vol. 63 ›› Issue (1): 109-112.doi: 10.13385/j.cnki.vacuum.2026.01.17
• Lectures on Vacuum Technology and Its Application • Previous Articles
ZHANG Yichen
CLC Number: O484;TB43
| [1] | YU Zhiqiang, WANG Zhonglian, REN Shaopeng, LOU Haiyu, LIN Xiaomin, LI Bing, LIU Weihang, YANG Zhaoxiang, CHENG Jiaxiang. Development of Medium Wave Infrared Narrowband Filter for CO2 Gas Analysis [J]. VACUUM, 2026, 63(1): 9-14. |
| [2] | ZHANG Yichen. No. 23: Ion Implantation and Ion Assisted Deposition Technology [J]. VACUUM, 2025, 62(6): 112-114. |
| [3] | . [J]. VACUUM, 2025, 62(4): 97-100. |
| [4] | . [J]. VACUUM, 2025, 62(3): 94-96. |
| [5] | OGATA Kiyoshi, SUZUKI Yasuo, BI Tingting. Development and Application of Intelligent DLC Thin Films by PIAD Technology——Study on Application to Metal Separators for Fuel Cells [J]. VACUUM, 2025, 62(2): 68-76. |
| [6] | LU Meijie, ZHENG Zihong, GAO Weinan, ZHENG Haozhi, LIU Gongwen, LIAN Songyou, XU Rongwang, WANG Jiangyong. Development of Quantitative Analysis Software for Film Depth Profiling [J]. VACUUM, 2025, 62(1): 37-43. |
| [7] | . [J]. VACUUM, 2025, 62(1): 86-88. |
| [8] | CHEN Yu-yun, WANG Xiao-xu, CHEN Yuan-ming, SHEN Yi, HUANG Rui. Study of Electrical Insulation Property of Magnetron Sputtered Silicon Oxide and Silicon Oxide/Silicon Nitride/Silicon Oxide Films [J]. VACUUM, 2024, 61(6): 15-20. |
| [9] | . [J]. VACUUM, 2024, 61(6): 85-88. |
| [10] | BAI Hao-yu, YAO Chun-long, DONG Ming, QIN Rui, BAI Yong-hao, WANG Yi-nan. Development of Ultra-High Steepness Edge Long Wave Pass Raman Filter [J]. VACUUM, 2024, 61(4): 12-16. |
| [11] | LI Rui-dong, JIN Da-li, ZHANG Mei-dong, YU Li-ping, WANG Jian-wei. Effect of Different Experimental Conditions on Charge Carrier Mobility of α-Se Films [J]. VACUUM, 2024, 61(4): 17-21. |
| [12] | ZHANG Yi-chen. No. 22:Chemical Vapor Deposition Technology [J]. VACUUM, 2024, 61(4): 102-104. |
| [13] | LI Can-min, DONG Zhong-lin, XIA Zheng-wei, ZHANG Xin-feng, WEI Rong-hua. Microstructure and Properties of TiCr-based Nanocomposite Coatings by Plasma Enhanced Magnetron Sputtering [J]. VACUUM, 2024, 61(2): 10-15. |
| [14] | . [J]. VACUUM, 2024, 61(2): 86-88. |
| [15] | . [J]. VACUUM, 2024, 61(1): 87-88. |
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