欢迎访问沈阳真空杂志社 Email Alert    RSS服务

VACUUM ›› 2026, Vol. 63 ›› Issue (1): 35-39.doi: 10.13385/j.cnki.vacuum.2026.01.06

• Thin Film • Previous Articles     Next Articles

Influence of Process Parameters of Dual Target Magnetron Sputtering on the Properties of AZO Thin Films

ZHANG Jian, YU Wei, SUN Bingcheng, ZHANG Xianwang   

  1. School of Mechanical and Power Engineering, Shenyang University of Chemical Technology, Shenyang 110142, China
  • Received:2024-04-12 Online:2026-01-25 Published:2026-02-02

Abstract: AZO thin films were sputtered on quartz glass substrate by dual-target magnetron sputtering technique. By adjusting the key process parameters such as sputtering power, sputtering pressure and substrate temperature, the specific effects of these parameters on the transmittance and conductivity of AZO thin films were studied in depth. The ATO film was characterized and analyzed by ultraviolet spectrophotometer and four-probe tester. The results show that the transmittance and resistivity of the films gradually decrease with the increase of sputtering power, the best transmittance is achieved at 30 W sputtering power, and the lowest resistivity is achieved at 50 W sputtering power of aluminum target. With the increase of sputtering gas pressure, the film transmittance and resistivity firstly increase and then decrease, and the best transmittance of AZO film in the visible light range reaches more than 90% at 0.7 Pa sputtering gas pressure, and the lowest resistivity is 43 Ω·cm at 1.0 Pa sputtering gas pressure. The best performance of the films is achieved at a substrate temperature of 250 ℃, with an average transmittance of 87% in the visible range and a resistivity of 38 Ω·cm.

Key words: AZO thin film, dual target magnetron sputtering, sputtering power, sputtering pressure, substrate temperature

CLC Number:  TB34

[1] 李慧,杨小天,王艳杰,等.溅射功率对掺铝氧化锌薄膜晶体管性能的影响[J]. 吉林建筑大学学报, 2022, 39(6): 78-81.
[2] 陈星辉,唐颖慧,王加强,等.衬底温度对氧化锌薄膜微结构及光学性能的影响[J]. 人工晶体学报,2021, 50(9): 1681-1687.
[3] LIU J H, YI Y H, ZHOU Y H, et al.Highly stretchable and flexible graphene/ITO hybrid transparent electrode[J]. Nanoscale Research Letters, 2016, 11(1): 108.
[4] 张庆远,王丽军,王小平,等.掺铝氧化锌(AZO)薄膜的应用及研究评述[J]. 材料科学与工程学报, 2018, 36(1): 133-141.
[5] 王今朝. 掺杂ZnO透明导电薄膜的光电性能与导电机理研究[D]. 武汉:湖北大学, 2016.
[6] 何双赐,钟志成,汪竞阳,等.衬底温度对共溅射制备AZO薄膜光电性能影响[J]. 压电与声光,2018,40(5):784-788.
[7] 冯媛媛,邓军,许晓芳,等.双靶共溅射制备AZO薄膜的光电性能研究[J]. 半导体光电,2021,42(5):656-661.
[8] 王延峰,谢希成,刘晓洁,等.F,Al共掺杂ZnO透明导电薄膜的制备及掺杂机理研究[J]. 物理学报,2020,69(19):306-314.
[9] ÁLVAREZ-VÁZQUEZ J I, SASTRÉ-HERNÁNDEZ J, ORTEGA-CERVANTEZ G, et al. Physical properties of aluminum doped Zinc Oxide thin films and single wall carbon nanotubes bilayers with potential application in photovoltaics devices[J]. Engineering Research Express, 2023, 5(3): 035034.
[10] 王航,师清奎,李谦,等.Al掺杂对ZnO薄膜形貌和光学性能的影响[J]. 半导体光电,2019,40(2):234-238.
[11] SUBRAMANYAM T K,GOUTHAM P, KUMAR S P, et al.Optimization of sputtered AZO thin films for device application[J]. Materials Today: Proceedings,2018,5(4):10851-10859.
[12] 刘亚强,陈青清,李朋.磁控溅射法制备铝掺杂氧化锌薄膜研究进展[J]. 信阳师范学院学报(自然科学版),2017,30(4):667-671.
[13] 王冶,王超,杨帆.铝掺杂量对于铝锌氧薄膜晶体管的电学性能的影响[J]. 吉林建筑大学学报,2021,38(2):83-88.
[14] PODDAR N P, MUKHERJEE S K.Investigations on preferentially oriented Al-doped ZnO films developed using rf magnetron sputtering[J]. Journal of Materials Science: Materials in Electronics, 2019, 30: 537-548.
[15] 姚婷婷,杨勇,李刚,等.直流磁控溅射功率对溅射生长GZO薄膜光电性能的影响[J]. 材料科学与工程学报,2017,35(5):747-751.
[16] 王玉新,崔潇文,藏谷丹,等.Al掺杂浓度对氧化锌纳米棒结构和光学性能的影响[J]. 功能材料, 2018,49(1):1001-1004.
[17] 陈首部,陆轴,兰椿.氧化锌薄膜的微观结构及其结晶性能研究[J]. 中南民族大学学报(自然科学版),2017,36(4):67-72.
[18] 陈星辉,陈家辉,张聚航,等.Al2O3掺杂对ZnO薄膜结构及光电性能的影响[J]. 湖南工业大学学报,2023,37(2):38-43.
[19] 韩岩岩. 反应磁控溅射制备AZO薄膜及其不稳定性[D]. 大连:大连理工大学, 2019.
[20] 薛腊梅. 掺杂ZnO薄膜压敏变阻特性及其调控[D]. 重庆:重庆理工大学, 2022.
[1] SUN Bingcheng, ZHANG Xianwang, ZHANG Jian. Study on the Effect of Radio Frequency Power on the Structure and Properties of ITO Films [J]. VACUUM, 2025, 62(2): 62-67.
[2] ZHANG Jian, QI Zhen-hua, LI Jian-hao, NIU Xia-bin, XU Quan-guo, ZONG Shi-qiang. Growth, Characterization of ITO Films Deposited by DC Magnetron Sputtering [J]. VACUUM, 2022, 59(6): 45-50.
[3] ZHANG Jian, LI Jian-hao, QI Zhen-hua. Effect of Process Parameters on SiC Film Properties under DC Magnetron Sputtering [J]. VACUUM, 2022, 59(4): 52-55.
[4] ZHU Bei-bei, NI Chang, QIN Lin, CHU Jian-ning, CHEN Xiao, XU Jian-feng. Nano Film Deposition Technology Based on Magnetron Sputtering [J]. VACUUM, 2021, 58(6): 21-26.
[5] WEI Meng-yao, WANG Hui, HAN Wen-fang, WANG Hong-li, SU Yi-fan, TANG Chun-mei, DAI Ming-jiang, SHI Qian. Study on Electrochromic Properties of Tungsten Oxide Films Deposited by Medium Frequency Magnetron Sputtering [J]. VACUUM, 2021, 58(5): 50-56.
[6] ZHANG Jian, NIU Xia-bin, LI Jian-hao, QI Zhen-hua. Effect of RF Power and Sputtering Pressure on Al Film Sputtered on Polythylene Terephthalate Substrates [J]. VACUUM, 2021, 58(4): 21-24.
[7] ZHANG Xin-hui, LI Qing-xiao. Effect of Vacuum Heat Treatment on Structure and Photoelectric Properties of AZO Film [J]. VACUUM, 2021, 58(3): 45-50.
[8] XIANG Yu-chun. Effect of Substrate Temperature on the Properties of CuO Films Deposited by Pulse Laser Deposition [J]. VACUUM, 2020, 57(5): 24-27.
[9] YAO Ting-ting, ZHONG Zhao-jin, LI Gang, TANG Yong-kang, YANG Yong, JIN Ke-wu, SHENG Hong-xue, WANG Tian-qi, PENG Saiao, JIN Liang-mao, SHEN Hong-lie, GAN Zhi-ping, MA Li-yun. Study on fabrication and properties of micro-nano structure AZO films by DC coupled RF sputtering [J]. VACUUM, 2018, 55(6): 64-67.
Viewed
Full text


Abstract

Cited
  Shared   
  Discussed   
[1] LI Min-jiu, XIONG Tao, JIANG Ya-lan, HE Yan-bin, CHEN Qing-chuan. 20kV high voltage based on double transistor forward converter pulse power supply for metal deburring[J]. VACUUM, 2018, 55(5): 19 -24 .
[2] LIU Yan-wen, MENG Xian-zhan, TIAN Hong, LI Fen, SHI Wen-qi, ZHU Hong, GU Bing. Test of ultra high vacuum in space traveling-wave tube[J]. VACUUM, 2018, 55(5): 25 -28 .
[3] HUANG Si, WANG Xue-qian, MO Yu-shi, ZHANG Zhan-fa, YING Bing. Experimental study on similarity law of liquid ring compressor performances[J]. VACUUM, 2018, 55(5): 42 -45 .
[4] WEI Jun、, LIU Zhi-hong, LI Bo, CHEN Xiao-li. Brazing and vacuum leak detection of large caliber alumina ceramic and stainless steel[J]. VACUUM, 2018, 55(5): 62 -65 .
[5] ZHAO Yan-hui, SHI Wen-bo, LIU Zhong-hai, LIU Zhan-qi, YU Bao-hai. Effect of deposition process parameters on arc ion plating[J]. VACUUM, 2018, 55(6): 49 -59 .
[6] ZHANG Fen-li, DENG Jing-lian, WANG Jie-feng, MENG Qing-yuan. Study on the pretreatment cleaning process of steel tube before coating[J]. VACUUM, 2018, 55(6): 60 -63 .
[7] DUAN Yong-li, Deng Wen-yu, QI Li-jun, LIU Kun, SUN Bao-yu, WANG Qing. Influence of Tb grain boundary diffusion on the magnetic performance and heat resistance of sintered NdFeB magnet[J]. VACUUM, 2018, 55(6): 76 -79 .
[8] XU Jun-qi, LI Hou-jun, LI Mian, WANG Jian, SU Jun-hong, GOLOSOV Dmitriy A.. Optical and laser damage characteristics of TiO2 films prepared by thermal evaporation deposition technique[J]. VACUUM, 2019, 56(1): 39 -44 .
[9] WANG Chun-ming, ZHANG Ming-da, SU Yu-ping. Discussion on leak detection method of vacuum application equipment[J]. VACUUM, 2019, 56(1): 52 -55 .
[10] ZHU Lei, LI Jing. Harm and prevent measures for chamber pollution of gas quenching furnace[J]. VACUUM, 2019, 56(1): 59 -62 .
辽ICP备06004570号-4
Copyright © VACUUM, All Rights Reserved.
Tel: （024）24134406 24110136 24121929　Fax: （024） 24121929　E-mail: zkzk1964@126.com
Powered by Beijing Magtech Co. Ltd