钯金属薄膜制备方法的研究现状与进展*

doi:10.13385/j.cnki.vacuum.2022.05.02

摘要/Abstract

摘要： 近年来,钯金属薄膜由于具有电阻率低和催化活性高等优异性能引起人们的广泛关注,钯及其合金薄膜在集成电路互连应用、氢传感、储氢和催化方面获得了越来越多科研工作者的兴趣。目前已有诸多制备钯金属薄膜的研究,本文重点介绍了利用物理气相沉积技术、化学气相沉积技术、原子层沉积技术以及等离子体辅助原子层沉积技术制备钯薄膜的研究现状,讨论了各种制备方法的优缺点,对所使用的前驱体作了总结,并展望了钯薄膜制备技术未来发展趋势。

关键词: Pd金属薄膜, 物理气相沉积, 化学气相沉积, 原子层沉积

Abstract: In recent years, palladium thin films have attracted wide attention due to their excellent properties such as low resistivity and high catalytic activity. Palladium and its alloy thin films have gained more and more interest from researchers in the applications of integrated circuit interconnection, hydrogen sensing, hydrogen storage and catalysis. There are many researches of the preparation of palladium metal film, this article focuses on the research development of preparation of palladium membrane using physical vapor deposition, chemical vapor deposition, atomic layer deposition and plasma auxiliary atomic layer deposition technology, and discusses the pros and cons of various preparation methods, sums up the precursor used to do, and prospects the development trend of preparation technology of palladium film.

Key words: palladium metal film, PVD, CVD, ALD

中图分类号:

TB383

王冬远, 周甜, 陈强, 刘忠伟. 钯金属薄膜制备方法的研究现状与进展^*[J]. 真空, 2022, 59(5): 7-13.

WANG Dong-yuan, ZHOU Tian, CHEN Qiang, LIU Zhong-wei. Research Status and Progress of Preparation Methods of Palladium Thin Films[J]. VACUUM, 2022, 59(5): 7-13.

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