Zr55Cu30Al10Ni5非晶薄膜的制备与性能研究*

doi:10.13385/j.cnki.vacuum.2022.05.01

真空 ›› 2022, Vol. 59 ›› Issue (5): 1-6.doi: 10.13385/j.cnki.vacuum.2022.05.01

• 薄膜 • 下一篇

Zr₅₅Cu₃₀Al₁₀Ni₅非晶薄膜的制备与性能研究^*

辛先峰¹, 刘林根¹, 林国强¹, 董闯^1,2, 丁万昱², 张爽², 王棋震², 李军², 万鹏³

1.大连理工大学,辽宁大连 116024;
2.大连交通大学,辽宁大连 116028;
3.佛山市顺德区美的电热电器制造有限公司,广东佛山 528300

收稿日期:2021-11-15 出版日期:2022-09-25 发布日期:2022-09-28
通讯作者: 董闯,教授;刘林根。
作者简介:辛先峰（1997-）,男,山东威海人,硕士。
基金资助:
*国家自然科学基金（51772038,52072056）; 辽宁省自然科学基金博士科研启动基金计划项目（2020-BS-208）; 顺德区科技计划项目（201911220001）

Preparation and Properties of Zr₅₅Cu₃₀Al₁₀Ni₅ Amorphous Thin Films

XIN Xian-feng¹, LIU Lin-gen¹, LIN Guo-qiang¹, DONG Chuang^1,2, DING Wan-yu², ZHANG Shuang², WANG Qi-zhen², LI Jun², WAN Peng³

1. Dalian University of Technology, Dalian 116024, China;
2. Dalian Jiaotong University, Dalian 116028, China;
3. Foshan Shunde Midea Electrical Heating Appliances Manufacturing Co., Ltd., Foshan 528300, China

Received:2021-11-15 Online:2022-09-25 Published:2022-09-28

摘要/Abstract

摘要： 非晶薄膜由于其优异的性能而被广泛研究,如不粘性和耐腐蚀性,这对于大块金属玻璃形成能力强的Zr₅₅Cu₃₀Al₁₀Ni₅成分来说尤为突出。本文以Zr₅₅Cu₃₀Al₁₀Ni₅块状金属玻璃为靶材,通过直流磁控溅射制备非晶合金薄膜,研究了不同溅射功率对薄膜力学性能、不粘性、耐蚀性和表面粗糙度的影响。结果表明,在磁控溅射功率为75~165W的范围内,可以获得高质量的非晶态薄膜,其硬度达到~9.2GPa,弹性模量~164GPa,硬弹性比~0.055,自腐蚀电流密度~1.16μA·cm^-2,自腐蚀电位-241.27mV,最大润湿角104°。这些性能数据与文献报道的接近,硬度甚至更高,证实该薄膜具有用于不粘和抗腐蚀方面的良好潜力。

关键词: Zr基非晶合金, 薄膜, 磁控溅射, 不粘性, 耐蚀性

Abstract: Amorphous alloy films have been widely investigated because of their excellent properties such as non-stick and corrosion resistance, which are especially prominent for bulk-metallic-glass-forming Zr₅₅Cu₃₀Al₁₀Ni₅ composition. In this work, amorphous alloy films are prepared by magnetron sputtering using Zr₅₅Cu₃₀Al₁₀Ni₅ bulk metallic glass as the target. The effects of different sputtering power on the mechanical properties, non-stick, corrosion resistance and surface roughness of the films were studied. The results show that high-quality amorphous films, as evaluated by mechanical properties, non-stick, and corrosion resistance, can be obtained at a magnetron sputtering power range from 75W to 165W, with hardness of ~9.2GPa, modulus of elasticity of ~164GPa, hardness-to-elasticity ratio of ~0.055, self-corrosion current density of ~1.16μA·cm^-2, self-corrosion potential of -241.27mV, and the maximum wetting angle of 104°. Such data are generally comparable with the reported ones（the hardness is even higher）, confirming a good potential for non-stick and corrosion resisting purposes.

Key words: Zr-based amorphous alloy, thin film, magnetron sputtering, non-stick, corrosion resistance

中图分类号:

TG174.4

辛先峰, 刘林根, 林国强, 董闯, 丁万昱, 张爽, 王棋震, 李军, 万鹏. Zr₅₅Cu₃₀Al₁₀Ni₅非晶薄膜的制备与性能研究^*[J]. 真空, 2022, 59(5): 1-6.

XIN Xian-feng, LIU Lin-gen, LIN Guo-qiang, DONG Chuang, DING Wan-yu, ZHANG Shuang, WANG Qi-zhen, LI Jun, WAN Peng. Preparation and Properties of Zr₅₅Cu₃₀Al₁₀Ni₅ Amorphous Thin Films[J]. VACUUM, 2022, 59(5): 1-6.

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Zr₅₅Cu₃₀Al₁₀Ni₅非晶薄膜的制备与性能研究^*

Preparation and Properties of Zr₅₅Cu₃₀Al₁₀Ni₅ Amorphous Thin Films

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