电子束蒸镀和磁控溅射沉积铝膜性能的对比研究*

doi:10.13385/j.cnki.vacuum.2026.04.02

真空 ›› 2026, Vol. 63 ›› Issue (4): 8-13.doi: 10.13385/j.cnki.vacuum.2026.04.02

电子束蒸镀和磁控溅射沉积铝膜性能的对比研究^*

付学成¹, 陈亮², 程秀兰¹, 杜鸿基², 史凯旋¹

1.上海交通大学先进电子材料与器件平台,上海 200240;
2.北京维开科技有限公司,北京 101300

收稿日期:2025-09-29 发布日期:2026-07-27
通讯作者: 程秀兰,研究员。
作者简介:付学成,男,河南夏邑人,高级实验师。
基金资助:
^*国家科技部“十四五”重点研发计划（2023YFC2413001）

Comparative Study on the Performance of Aluminum Films Deposited by Electron Beam Evaporation and Magnetron Sputtering

FU Xuecheng¹, CHEN Liang², CHENG Xiulan¹, DU Hongji², SHI Kaixuan¹

1. Advanced Electronics Materials and Devices, Shanghai Jiao Tong University, Shanghai 200240, China;
2. Beijing Vikaitech Co., Ltd., Beijing 101300 China

Received:2025-09-29 Published:2026-07-27

摘要/Abstract

摘要： 采用双腔电子束蒸发系统,结合改进型无底三氧化二铝坩埚与分步蒸镀工艺,显著提升了铝膜的致密性与均匀性。在4英寸硅衬底上沉积1 μm厚铝膜的对比实验中,系统评估了电子束蒸发与磁控溅射两种方法在电阻率、均匀性、反射率及致密性等关键性能指标上的差异。结果表明,优化后的电子束蒸发技术所制备的铝膜在电阻率、均匀性与反射率方面均优于磁控溅射样品;而在致密性方面,两种方法未表现出显著差异。该研究为重新审视电子束蒸发与磁控溅射在铝膜制备中的性能优劣提供了新的实验依据。

关键词: 双腔电子束蒸发系统, 电子束蒸镀, 磁控溅射, 铝薄膜, 性能对比

Abstract: Using a dual-chamber electron beam evaporation system and an improved bottomless alumina crucible, combined with a step-by-step evaporation process, the density and uniformity of aluminum films deposited by electron beam evaporation are significantly enhanced. Compared with the magnetron sputtering coating equipment, 1-micron-thick aluminum films were deposited on 4-inch silicon substrates. The resistivity, uniformity, reflectivity, and density of the films were tested. The results show that the aluminum films prepared by the improved electron beam evaporation technique outperform those deposited by magnetron sputtering in terms of resistivity, uniformity, and reflectivity, while there is no difference in density between the two methods. This research provides new evidence for revising the performance comparison between the two methods in preparing aluminum films.

Key words: dual-chamber electron beam evaporation system, electron beam evaporation, magnetron sputtering, aluminum film, performance comparison

中图分类号: TB43

付学成, 陈亮, 程秀兰, 杜鸿基, 史凯旋. 电子束蒸镀和磁控溅射沉积铝膜性能的对比研究^*[J]. 真空, 2026, 63(4): 8-13.

FU Xuecheng, CHEN Liang, CHENG Xiulan, DU Hongji, SHI Kaixuan. Comparative Study on the Performance of Aluminum Films Deposited by Electron Beam Evaporation and Magnetron Sputtering[J]. VACUUM, 2026, 63(4): 8-13.

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电子束蒸镀和磁控溅射沉积铝膜性能的对比研究^*

Comparative Study on the Performance of Aluminum Films Deposited by Electron Beam Evaporation and Magnetron Sputtering

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