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VACUUM ›› 2022, Vol. 59 ›› Issue (5): 32-37.doi: 10.13385/j.cnki.vacuum.2022.05.06

• Thin Film • Previous Articles     Next Articles

Analysis of Influence of Cathode Spot Movement on Film Quality in Arc Ion Plating Technology

QIAO Hong1, LI Can-lun1, LIN Zeng2, WANG Song-chao1, FENG Zhi-meng1, LI Shao-jie1, HUANG Yun1, JIN Zhao-feng1   

  1. 1. Shanghai Institute of Spacecraft Equipment, Shanghai 200240, China;
    2. School of Mechanical Engineering & Automation, Northeastern University, Shenyang 110819, China
  • Received:2022-03-07 Online:2022-09-25 Published:2022-09-28

Abstract: With the wide application of thin film materials in modern industry,arc ion plating technology has become an important method for preparing functional films, such as functional surface modification and surface metallization of composite materials in the field of aerospace. In order to verify the state of cathode spot movement under different magnetic fields, the cathode spot on Ti target was controlled by magnetic field. TiN films were prepared under five magnetic fields, and the surface morphology, microstructure, chemical composition and thickness of TiN film were detected and analyzed through scanning electron microscope, energy disperse spectroscopy, step profiler and X-ray diffractometer. The results show that the film has the least number of large particles, the film is the thickest, and the crystal preferential growth direction is (111) crystal plane, when the cathode spot controlled by the magnetic field is uniformly distributed on the entire Ti target surface and the cathode spot movement speed increased.

Key words: arc ion plating, cathode spot, magnetic field, film analysis

CLC Number: 

  • TN305.8
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