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VACUUM ›› 2025, Vol. 62 ›› Issue (6): 25-30.doi: 10.13385/j.cnki.vacuum.2025.06.04

• Thin Film • Previous Articles     Next Articles

Study on Optical Properties of Silicon Oxide Thin Films Prepared by Magnetron Sputtering

ZHANG Xianwang, ZHANG Jian   

  1. School of Mechanical and Power Engineering, Shenyang University of Chemical Technology, Shenyang 110142, China
  • Received:2024-03-28 Online:2025-11-25 Published:2025-11-27

Abstract: Silicon oxide thin films were fabricated on the glass substrate using radio frequency magnetron sputtering method by controlling variables. The influence of process parameters including gas pressure, sputtering power, substrate temperature on the thickness, roughness and transmittance of the silicon oxide film were studied using the step meter and spectrometer. The results show that the film roughness is the lowest at sputtering pressure of 0.8 Pa, substrate temperature of 150 ℃ and sputtering power of 310 W. The film transmittance is maximized at sputtering pressure of 0.8 Pa, substrate temperature of 250 ℃, and sputtering power of 250 W.

Key words: magnetron sputtering, silicon oxide thin film, film thickness, roughness, transmittance

CLC Number:  TB43

[1] 任瑛琪. 二氧化硅光子晶体的制备及电响应性能研究[D]. 上海:上海应用技术大学,2023.
[2] 张汉焱,郑丹旭,沈奕,等.中频磁控反应溅射氧化硅(SiOx)薄膜绝缘性的研究[J].真空,2023,60(2):34-38.
[3] 罗海瀚,刘定权,尹欣,等. 沉积温度对一氧化硅薄膜聚集密度的影响[J]. 光子学报,2012,41(2):170-172.
[4] HERGUEDAS N,CARRETERO E.Optical properties in mid-infrared range of silicon oxide thin films with different stoichiometries[J]. Nanomaterials, 2023,13(20):2749.
[5] 王济洲,熊玉卿,王多书,等.退火工艺对氧化硅薄膜光学及机械性能的影响研究[C]//中国真空学会薄膜专业委员会.TFC'13全国薄膜技术学术研讨会论文摘要集. 2013.
[6] 刘雨涛,梁庭,王心心,等. ICPECVD法制备氧化硅薄膜的工艺研究[J]. 仪表技术与传感器,2016(4):13-14.
[7] 王新,向嵘,李野,等. 氧化硅薄膜的制备和性质研究[J]. 微电子学,2010,40(3):454-456.
[8] 姜德龙,王新,向嵘,等. 磁控溅射制备氧化硅薄膜生长速率[J]. 发光学报,2009,30(6):888-891.
[9] 金桂,黄小益,蒋纯志.硅靶低温射频磁控溅射沉积氧化硅薄膜的电击穿场强[J].真空与低温,2009,15(3):174-177
[10] 马书懿,秦国刚,马振昌,等.富硅量不同的富硅二氧化硅薄膜的光致发光研究[J].半导体学报,1998(10):21-25.
[11] 阮洪良,阮泽云,陈金桂,等.自清洁SiO2/TiO2减反膜的制备与性能研究[J].化工新型材料,2023,51(增刊1):106-109.
[12] WANG L S, ZHAO C J, ZHAO L R, et al.Effect of O2/Ar flow ratio and heat treatment on the structure and properties of SiO2 film prepared by magnetron sputtering[J].Physica B: Physics of Condensed Matter,2022,630: 413537.
[13] 西北电讯工程学院503室.氧化硅薄膜电容器组成结构与性能的关系[J].西北电讯工程学院学报,1977(2):84-91.
[14] 朱昌,米高园,达斯坦科,等. 比较2种溅射方法镀制的氧化硅薄膜[J]. 应用光学,2010,31(5):855-859.
[15] 宗婉华,马振昌,王立侠. 磁控溅射二氧化硅薄膜的制备工艺[J]. 半导体情报,1994, (6):29-33.
[16] 许生,侯晓波,范垂祯等.硅靶中频反应磁控溅射二氧化硅薄膜的特性研究[J].真空,2001,38(5):1-6.
[17] 叶光,林志贤,郭太良. 射频磁控溅射二氧化硅薄膜的工艺探讨[J]. 龙岩师专学报,2002,20(6):44-45.
[18] 朱春燕,王稳奇,郗华. 反应磁控溅射法制备二氧化硅薄膜的研究[J]. 表面技术,2010,39(4):8-10.
[19] 张剑,陈文革.直流磁控溅射制备二氧化硅薄膜及其性能[J].中国表面工程,2013,26(1):34-39.
[20] 丁安邦. 中频反应磁控溅射制备二氧化硅薄膜及其结构与光学性能的研究[D]. 大连:大连理工大学,2013.
[21] 梁云忠. 中频反应磁控溅射制备二氧化硅薄膜的工艺研究[D]. 哈尔滨:哈尔滨工业大学,2008.
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