VACUUM ›› 2023, Vol. 60 ›› Issue (5): 47-50.doi: 10.13385/j.cnki.vacuum.2023.05.06
• Thin Film • Previous Articles Next Articles
LIU Wen-li, LIU Xu, YIN Xiang
CLC Number: TB43;O461
| [1] 张以忱, 王德志, 李灿伦, 等. 圆平面磁控溅射靶磁场的ANSYS模拟分析[J]. 真空, 2011, 48(2): 1-5. [2] 石晓倩. 磁控溅射靶的研发[D]. 大连: 大连交通大学, 2020. [3] LIU S, CHEN J, SUN B, et al.Evolution of microstructure of IGZO ceramic target during magnetron sputtering[J]. Ceramics International, 2022, 48(6): 7500-7511. [4] GUO D Z, CHEN S K, MA Y S.Simulation of plasma properties in magnetron sputtering for two kinds of cathode targets[J]. Radiation Detection Technology and Methods, 2020(4): 10-16. [5] 石晓倩, 于荣环, 乌云额尔德尼, 等.基于磁控溅射靶的磁场分布优化[J]. 大连交通大学学报, 2019, 40(4): 108-111. [6] 陈长平, 佘鹏程, 陈峰武, 等. 高靶材利用率高镀膜均匀性条形溅射靶的设计与实现[J]. 中国集成电路, 2021(7): 70-73. [7] 刘齐荣, 董国波, 高方圆, 等. 平面磁控溅射靶磁场的模拟优化设计[J]. 真空科学与技术学报, 2013, 33(12): 1223-1228. [8] 薛莹洁. 平面磁控溅射靶的优化设计及膜厚均匀性分析[D]. 西安: 陕西科技大学, 2017. [9] 郭帆. 双靶磁控溅射过程仿真及其实验的研究[D]. 哈尔滨: 哈尔滨商业大学, 2022. [10] IDE T, HOSSAIN A, NAKAMURA Y, et al.Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization[J]. Journal of Vacuum Science & Technology A, 2017, 35(6): 061312. [11] GENCOA. Single rectangular[EB/OL].[2022-09-06]. https://www.gencoa.com/single-rectangular. [12] 石中兵, 童洪辉, 赵嘉学. 磁控溅射矩形靶磁场的优化设计[J]. 真空与低温, 2004, 10(2): 112-116. [13] OHTSU Y, TANAKA R, NAKASHIMA T. Development of rotational maze-shaped RF magnetron plasma for successful target utilization and thin-film preparation[J]. Japanese Journal of Applied Physics, 2021, 60(SA): SAAB01. [14] 黄福民, 王朴. 偏心旋转移动平面磁控溅射在ITO玻璃生产中的应用与探讨[J]. 真空, 2005, 42(3): 27-29. [15] ISEKI T.Flat erosion magnetron sputtering with a moving unbalanced magnet[J]. Vacuum, 2006, 80(7): 662-666. [16] 张以忱. 真空镀膜技术[M]. 北京: 冶金工业出版社, 2009. [17] 夏先春. 物理气相沉积镀膜机器关键零部件设计与分析[D]. 苏州: 苏州大学, 2017. [18] 张以忱. 真空镀膜设备[M]. 北京: 冶金工业出版社, 2009. [19] 李鹤. 矩形磁控溅射靶磁场仿真与优化设计[D]. 沈阳: 东北大学, 2008. [20] KUWAHARA, K, FUJIYAMA H.Application of the child-langmuir law to magnetron discharge plasmas[J]. IEEE Transactions on Plasma Science, 1994, 22(4): 442-448. [21] 沈向前, 谢泉, 肖清泉, 等. 磁控溅射靶材刻蚀特性的模拟研究[J].真空,2012,49(1):65-69. [22] 韩大凯, 陈庆川, 王经权. 磁控溅射靶的磁路设计[J]. 真空, 2007, 44(6): 14-17. |
| [1] | ZHANG Yan-peng, CAO Zhi-qiang, FU Qiang, CAO Lei, LIU Xu. Study of the Influence of Process Parameters of Copper Coating Fabricated by Roll to Roll Machine on Electronic Property of Composite Current Collector [J]. VACUUM, 2023, 60(4): 8-12. |
| [2] | ZHANG Han-yan, ZHENG Dan-xu, SHEN Yi, CHEN Yu-yun. Research of Insulation of Silicon Oxide Film Produced by Medium Frequency Magnetron Sputtering [J]. VACUUM, 2023, 60(2): 34-38. |
| [3] | ZHANG Jian, QI Zhen-hua, LI Jian-hao, NIU Xia-bin, XU Quan-guo, ZONG Shi-qiang. Growth, Characterization of ITO Films Deposited by DC Magnetron Sputtering [J]. VACUUM, 2022, 59(6): 45-50. |
| [4] | ZHAO Qi, MAN Yu-yan, LI Su-ya, LI Song-yuan, LI Lin. Research on Performance Controlling Method of Fluorocarbon Nanostructured Film for Dry Reactors [J]. VACUUM, 2022, 59(6): 51-55. |
| [5] | XIN Xian-feng, LIU Lin-gen, LIN Guo-qiang, DONG Chuang, DING Wan-yu, ZHANG Shuang, WANG Qi-zhen, LI Jun, WAN Peng. Preparation and Properties of Zr55Cu30Al10Ni5 Amorphous Thin Films [J]. VACUUM, 2022, 59(5): 1-6. |
| [6] | ZHANG Jian, LI Jian-hao, QI Zhen-hua. Effect of Process Parameters on SiC Film Properties under DC Magnetron Sputtering [J]. VACUUM, 2022, 59(4): 52-55. |
| [7] | ZHANG Hui, Wang Xiao-bo, ZHANG Wei-xin, GONG Chun-zhi, TIAN Xiu-bo. Effect of Substrate Bias Mode on Structure and Hydrogen Resistance of CrN Thin Films [J]. VACUUM, 2022, 59(1): 18-23. |
| [8] | LIU Yuan-dong. Study on the Properties of Large-area ZnO Thin Films Fabricated by Magnetron Sputtering Deposition [J]. VACUUM, 2022, 59(1): 29-32. |
| [9] | ZHU Bei-bei, NI Chang, QIN Lin, CHU Jian-ning, CHEN Xiao, XU Jian-feng. Nano Film Deposition Technology Based on Magnetron Sputtering [J]. VACUUM, 2021, 58(6): 21-26. |
| [10] | HE Ping, ZHANG Xu, YANG yang. Study on Magnetron Sputtering Film Process on Inner Wall of Cylinder with Different Matrix Materials [J]. VACUUM, 2021, 58(6): 33-37. |
| [11] | YANG Zhao, LUO Jun-yao, LI Bao-chang, LI Shu-hua, TA Shi-wo, FU Zhen-xiao, NING Hong-long. Effect of Metallic Multilayer Films on Gold Wire Bonding Properties [J]. VACUUM, 2021, 58(6): 43-47. |
| [12] | WEI Meng-yao, WANG Hui, HAN Wen-fang, WANG Hong-li, SU Yi-fan, TANG Chun-mei, DAI Ming-jiang, SHI Qian. Study on Electrochromic Properties of Tungsten Oxide Films Deposited by Medium Frequency Magnetron Sputtering [J]. VACUUM, 2021, 58(5): 50-56. |
| [13] | ZHANG Xiao-xia, DENG Jin-xiang, KONG Le, LI Rui-dong, YANG Zi-shu, ZHANG Jie. Preparation and Study of Si-doped β-Ga2O3 Thin Films with Different Content [J]. VACUUM, 2021, 58(5): 57-61. |
| [14] | FU Xue-cheng, XU Jin-bin, WU Li-ying, HUANG Sheng-li, WANG Ying. Study on Uniformity of Inclined Magnetron Sputtering with Small Circular Plane Target [J]. VACUUM, 2021, 58(4): 1-5. |
| [15] | ZHANG Jian, NIU Xia-bin, LI Jian-hao, QI Zhen-hua. Effect of RF Power and Sputtering Pressure on Al Film Sputtered on Polythylene Terephthalate Substrates [J]. VACUUM, 2021, 58(4): 21-24. |
|
||