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VACUUM ›› 2024, Vol. 61 ›› Issue (3): 57-62.doi: 10.13385/j.cnki.vacuum.2024.03.10

• Thin Film • Previous Articles     Next Articles

Effect of Deposition Parameters on Microstructure and Optical Properties of TiO2 Nanofilms

JI Jian-chao1,2, YAN Yue1,2, HA En-hua1,2   

  1. 1. Beijing Institute of Aeronautical Materials Co. LTD., Beijing 100095, China;
    2. Beijing Engineering Centre of Advanced Structural Transparencies for the Modern Traffic System, Beijing 100095, China
  • Received:2023-10-26 Published:2024-06-04

Abstract: Nano-sized TiO2 optical films were deposited on PMMA by DC pulsed magnetron sputtering method. The effects of deposition power, substrate temperature on the structure and optical properties of TiO2 films were studied. The optical properties, elemental composition, crystallization properties and microstructure of the films were analyzed by means of elliptic polarization analyzer, X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), spectrophotometer and atomic force microscope (AFM). The results show that with the increase of deposition power, the oxygen content of the film decreases, the particle size of the film decreases, and the refractive index increases, while the transmittance and reflectivity of the visible light band decreases. The increasing substrate temperature reduces the deposition rate of the film and promotes the aggregation of the film particles. The refractive index and visible light transmittance both increase with the substrate temperature. The band gap of TiO2 film ranges between 3.12-3.16 eV and decreases with the increase of deposition power and substrate temperature.

Key words: TiO2 thin film, magnetron sputtering, microstructure, optical property

CLC Number:  TB34

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