真空 ›› 2022, Vol. 59 ›› Issue (6): 51-55.doi: 10.13385/j.cnki.vacuum.2022.06.09
赵琦1,2, 满玉岩3, 李苏雅1,2, 李松原1,2, 李琳1,2
ZHAO Qi1,2, MAN Yu-yan3, LI Su-ya1,2, LI Song-yuan1,2, LI Lin1,2
摘要: 氟碳薄膜具有低介电常数和摩擦系数、高热稳定性和化学惰性、强紫外吸收等优点,作为表面修饰材料,有望提升干式电抗器运行时的环境耐候性和绝缘稳定性。以磁控溅射技术制备氟碳薄膜具有杂质粒子污染少、沉积面积大、反应物成本低、无环境污染等优点。溅射过程中等离子体状态是影响薄膜质量的关键因素,本文讨论了真空室温度和基底温度协同作用对氟碳薄膜化学组分、微结构、沉积速率和微观形貌的影响。结果表明:温度直接作用于溅射组分的产生、输运和沉积过程;温度升高使薄膜表面呈现颗粒-团簇-三维网状结构的形貌演化规律;随溅射温度增加,沉积速率、粗糙度、氟碳比和sp3杂化碳占比增大,薄膜朝类聚四氟乙烯(PTFE-like)的方向发展,有望获得更优异的理化特性。
中图分类号:
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