面向干式电抗器的氟碳纳米结构薄膜性能调控方法研究*

doi:10.13385/j.cnki.vacuum.2022.06.09

真空 ›› 2022, Vol. 59 ›› Issue (6): 51-55.doi: 10.13385/j.cnki.vacuum.2022.06.09

面向干式电抗器的氟碳纳米结构薄膜性能调控方法研究^*

赵琦^1,2, 满玉岩³, 李苏雅^1,2, 李松原^1,2, 李琳^1,2

1.国网天津市电力公司电力科学研究院,天津300384;
2.天津市电力物联网企业重点实验室,天津300384;
3.国网天津市电力公司,天津300010

收稿日期:2022-04-15 出版日期:2022-11-25 发布日期:2022-12-05
通讯作者: 满玉岩,教授级高工。
作者简介:赵琦（1989-）,男,河北省沧州市人,博士,工程师。
基金资助:
^*国网天津市电力公司科技项目（KJ22-1-36）

Research on Performance Controlling Method of Fluorocarbon Nanostructured Film for Dry Reactors

ZHAO Qi^1,2, MAN Yu-yan³, LI Su-ya^1,2, LI Song-yuan^1,2, LI Lin^1,2

1. State Grid Tianjin Electric Power Research Institute, Tianjin 300384, China;
2. Tianjin Key Laboratory of Internet of Things in Electricity, Tianjin 300384, China;
3. State Grid Tianjin Electric Power Company, Tianjin 300010, China

Received:2022-04-15 Online:2022-11-25 Published:2022-12-05

摘要/Abstract

摘要： 氟碳薄膜具有低介电常数和摩擦系数、高热稳定性和化学惰性、强紫外吸收等优点,作为表面修饰材料,有望提升干式电抗器运行时的环境耐候性和绝缘稳定性。以磁控溅射技术制备氟碳薄膜具有杂质粒子污染少、沉积面积大、反应物成本低、无环境污染等优点。溅射过程中等离子体状态是影响薄膜质量的关键因素,本文讨论了真空室温度和基底温度协同作用对氟碳薄膜化学组分、微结构、沉积速率和微观形貌的影响。结果表明：温度直接作用于溅射组分的产生、输运和沉积过程;温度升高使薄膜表面呈现颗粒-团簇-三维网状结构的形貌演化规律;随溅射温度增加,沉积速率、粗糙度、氟碳比和sp³杂化碳占比增大,薄膜朝类聚四氟乙烯（PTFE-like）的方向发展,有望获得更优异的理化特性。

关键词: 氟碳薄膜, 磁控溅射, 微纳结构, 理化特性

Abstract: Fluorocarbon(FC) film exhibits characteristics of low dielectric constant and friction coefficient, high thermal stability and chemical inertness, strong ultraviolet absorption, etc. As a surface modification material, it is expected to improve environmental weatherability and insulation stability of dry reactors during operation. Research on FC film preparation by sputtering has the advantages of less contamination by impurity particles, large deposition area, low cost of reactants, and no environmental pollution. The plasma state during sputtering is a key factor affecting the quality of FC film. This paper discusses the synergistic effects of vacuum chamber temperature and substrate temperature on the chemical composition, microstructure, deposition rate and micromorphology of FC film. The results show that the temperature directly influence generation, transportation and deposition of sputtering components. The increment of temperature results in morphology evolution law of particle-cluster-three-dimensional network structure. Deposition rate, roughness, fluorine to carbon ratio and the proportion of sp³ hybrid carbon increase with the sputtering temperature. Therefore, FC film develops in the direction of PTFE-like film, which is expected to exhibit more excellent physio-chemical properties.

Key words: fluorocarbon film, magnetron sputtering, micro-nano structure, physio-chemical property

中图分类号:

O484

赵琦, 满玉岩, 李苏雅, 李松原, 李琳. 面向干式电抗器的氟碳纳米结构薄膜性能调控方法研究^*[J]. 真空, 2022, 59(6): 51-55.

ZHAO Qi, MAN Yu-yan, LI Su-ya, LI Song-yuan, LI Lin. Research on Performance Controlling Method of Fluorocarbon Nanostructured Film for Dry Reactors[J]. VACUUM, 2022, 59(6): 51-55.

参考文献

[1] TAKAHASHI K, MITAMURA T, ONO K, et al.Characterization of porosity and dielectric constant of fluorocarbon porous films synthesized by using plasma- enhanced chemical vapor deposition and solvent process[J]. Applied Physics Letters, 2003, 82(15): 2476-2478.
[2] LI W, TAN X D, LIU D P, et al.Growth of fluorocarbon films by low-pressure dielectric barrier discharge[J]. Plasma Science and Technology, 2008, 10(1): 74-77.
[3] XIANG H, KOMVOPOULOS K.Effect of fluorocarbon self-assembled monolayer films on sidewall adhesion and friction of surface micromachines with impacting and sliding contact interfaces[J]. Journal of Applied Physics, 2013, 113(22): 224505.
[4] ZANDONA P.The effects of changing deposition conditions on the similarity of sputter-deposited fluorocarbon thin films to bulk PTFE[D]. Newark, USA: University of Delaware, 2014.
[5] MOUNTSIER T W, SAMUELS J A.Precursor selection for plasma deposited fluorinated amorphous carbon films[J]. Thin Solid Films, 1998, 332(1/2): 362-368.
[6] KIM M, KANG T W, KIM S H, et al.Antireflective, self-cleaning and protective film by continuous sputtering of a plasma polymer on inorganic multilayer for perovskite solar cells application[J]. Solar Energy Materials and Solar Cells, 2019, 191: 55-61.
[7] KIM S H, KIM M, LEE J H, et al.Self-cleaning transparent heat mirror with a plasma polymer fluorocarbon thin film fabricated by a continuous roll-to-roll sputtering process[J]. ACS Applied Materials & Interfaces, 2018, 10(12): 10454-10460.
[8] 郑欣, 张鹏飞, 李江萍. 亲水型自清洁氟碳涂料的制备及其性能研究[J]. 涂料工业, 2013, 43(1): 59-62.
[9] ZHOU Y, LI M, ZHONG X, et al.Hydrophobic composite coatings with photocatalytic self-cleaning properties by micro/nanoparticles mixed with fluorocarbon resin[J]. Ceramics International, 2015, 41(4): 5341-5347.
[10] 王荣民, 刘发锐, 何玉凤, 等. 改性纳米氟碳涂料的自清洁性与抗菌性[J]. 石油化工, 2013, 42(3): 325-329.
[11] 叶超. α-C: F薄膜的沉积、结构与介电性质研究[D]. 苏州: 苏州大学, 2001.
[12] 江美福. 反应磁控溅射法制备的氟化类金刚石薄膜的结构和性能研究[D]. 苏州: 苏州大学, 2005.
[13] KELLY P J, ARNELL R D.Magnetron sputtering: a review of recent developments and applications[J]. Vacuum, 2000, 56(3): 159-172.
[14] SEROV A.Preparation and basic properties of nanostructured plasma polymers[D]. Prague, Czech Republic: Charles University in Prague, 2014.
[15] 邵晶晶, 任芝龙, 杨雅伦, 等. 磁控溅射制备聚四氟乙烯低温超疏水薄膜[J]. 真空科学与技术学报, 2017, 37(2): 154-160.
[16] 中岛直人, 羽田浩二, 吉野裕文. 溅射装置: CN104947047A[P].2015-09-30.
[17] GONON P, SYLVESTRE A, BUSTARRET E.Investigation of fluorocarbon thin films as dielectric materials for electronic applications[C]//Proceedings of the 7th International Conference on Properties and Applications of Dielectric Materials. Nagoya, Japan: IEEE, 2003: 92-95.
[18] MUKHERJEE T.Investigation of post-plasma etch fluorocarbon residue characterization, removal and plasma-induced low-k damage for advanced interconnect applications[D]. Texas, USA: University of North Texas, 2016.
[19] HELLGREN N, JOHANSSON M P, BROITMAN E, et al.Role of nitrogen in the formation of hard and elastic CN_x thin films by reactive magnetron sputtering[J]. Physical Review B, 1999, 59(7): 5162.
[20] NGARUIYA J M.Fundamental processes in growth of reactive DC magnetron sputtered thin films[D]. Aachen, Germany: Rheinisch-Westfälische Technische Hochschule, 2004.
[21] ELDERS J, JANSEN H V, ELWENSPOEK M.Materials analysis of fluorocarbon films for MEMS applications[C]// Proceedings IEEE Micro Electro Mechanical Systems An Investigation of Micro Structures, Sensors, Actuators, Machines and Robotic Systems, Oiso, Japan: IEEE, 1994: 170-175.

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面向干式电抗器的氟碳纳米结构薄膜性能调控方法研究^*

Research on Performance Controlling Method of Fluorocarbon Nanostructured Film for Dry Reactors

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