磁控溅射制备大面积ZnO薄膜性能的研究

doi:10.13385/j.cnki.vacuum.2022.01.06

摘要/Abstract

摘要： 通过磁控溅射氧化锌陶瓷靶材的方法在玻璃基片上制备ZnO薄膜,研究了溅射功率、溅射气压以及基片温度对ZnO薄膜相结构、禁带宽度及光学性能的影响。使用X射线衍射仪（XRD）分析了薄膜相结构,使用台阶仪测试薄膜厚度,采用薄膜测试仪测试薄膜的透过率,采用扫描电镜（SEM）观察薄膜表面形貌。结果表明：不同制备条件下均形成具有（002）择优取向的ZnO薄膜;工艺参数主要对薄膜的透过率造成影响;溅射功率的大小影响生成薄膜的完整性。

关键词: 磁控溅射, ZnO薄膜, 透过率

Abstract: ZnO thin films were deposited on glass substrate by magnetron sputtering ZnO ceramic targets. The phase structure, band gap, transmittance and microstructure of the films were investigated by X-ray diffraction,scanning electron microscope and multifunctional film tester. The results show that the ZnO films with（002）preferred orientation can be formed under different process parameters. The process parameters affect the transmittance of the films. The coverage of films is determined by the sputtering power.

Key words: magnetron sputtering, ZnO films, process parameters, transmittance

中图分类号:

TB43

刘沅东. 磁控溅射制备大面积ZnO薄膜性能的研究[J]. 真空, 2022, 59(1): 29-32.

LIU Yuan-dong. Study on the Properties of Large-area ZnO Thin Films Fabricated by Magnetron Sputtering Deposition[J]. VACUUM, 2022, 59(1): 29-32.

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