真空 ›› 2021, Vol. 58 ›› Issue (1): 57-62.doi: 10.13385/j.cnki.vacuum.2021.01.12
吴键坤1,2, 李兆国2, 彭丽萍2, 易勇1, 张继成2
WU Jian-kun1,2, LI Zhao-guo2, PENG Li-ping2, YI yong1, ZHANG Ji-cheng2
摘要: 采用直流反应磁控溅射法,通过改变反应气体N2分压(5%、10%、20%、30%、40%、50%、60%),在SiO2/Si(111)基片上制备ZrN薄膜。利用XRD、SEM、EDS分析了薄膜的物相、结构、形貌以及成分,使用分光光度计测量了薄膜的反射光谱,并进一步确定了薄膜颜色在L*a*b*色度坐标中的位置,研究了氮分压对薄膜颜色的影响,以及ZrN薄膜颜色与薄膜成分、结构之间的关系。分析结果表明:在不同的氮分压下,ZrN薄膜具有较好的成膜质量;随着氮分压的增加,薄膜沉积速率降低、N含量增加;薄膜结晶度先升高后降低、且在氮分压为10%时,薄膜出现(111)的择优取向;薄膜颜色随薄膜成分结构的改变而发生明显的变化(颜色由银色向金色、暗金、深褐色以及非本征颜色转变)。当反应气体N2分压较低时,分压的增加使得锆与氮更容易键合,导致薄膜中N含量增加,使ZrN结晶度增大并出现择优取向。当N2分压超过10%后,薄膜中多余的氮处于晶格的间隙位置,使得薄膜晶格间距变大且结晶度降低,薄膜成分结构的改变导致了薄膜颜色的变化。
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