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VACUUM ›› 2021, Vol. 58 ›› Issue (6): 33-37.doi: 10.13385/j.cnki.vacuum.2021.06.06

• Thin Film • Previous Articles     Next Articles

Study on Magnetron Sputtering Film Process on Inner Wall of Cylinder with Different Matrix Materials

HE Ping1, ZHANG Xu1, YANG yang1   

  1. The Institute of Physical and Chemical Engineering of Nuclear Industry, Tianjin 300180, China
  • Received:2020-11-26 Online:2021-11-25 Published:2021-11-30

Abstract: The barrel is made of composite materials and metal flexible components. The cylinder can not directly contact with the working medium, and thus a protective film needs to be deposited onto the inner wall. In this paper, through the screening of different material pretreatment processes of the cylinder, the magnetron sputtering process is used for process research and trial production. Finally, the integrated coating process route is determined and the corresponding process parameters are developed. The process parameters were used to realize one-time coating on the inner wall of the cylinder successfully. The as-prepared film is complete and has a certain binding force and film thickness.

Key words: composite materials, magnetron sputtering, coat process, binding force

CLC Number: 

  • O484.5
[1] 敬松. 不锈钢波纹管补偿器腐蚀开裂原因分析[J]. 设备管理与维修, 2020(8): 52-54.
[2] 周宗娴. 马氏体时效钢和铝合金在UF_6中的腐蚀与强度行为[J]. 腐蚀科学与防护技术, 1996(4): 30-34.
[3] 梁加刚, 许昌庆, 王标, 等.高能离子刻蚀前处理对AlTiSiN涂层切削性能的影响[J]. 表面技术, 2019, 48(4): 145-151.
[4] 赵洋, 周林, 张涛, 等.PVD涂层在汽车模具上的应用及结合力改善研究[J]. 重庆理工大学学报(自然科学), 2019, 33(3): 155-160.
[5] 成健, 方世超, 刘顿,等.金属表面激光清洗技术及其应用[J]. 应用激光, 2018, 38(6): 1028-1037.
[6] 杜强. 多物理场下环氧树脂表面电荷动态特性研究[D]. 天津: 天津大学, 2018.
[7] 唐飞熊, 但敏, 刘镜波, 等.磁控溅射镀膜技术在高分子轻量化材料中的应用[J]. 工程塑料应用, 2016, 44(7): 57-61+78.
[8] YU Z Q, LI L M, SHI B X, et al.Magnetic field switching of cylindrical magnetron sputtering rates for coating glass fibers and rods[J]. Japanese Journal of Applied Physics, 2014, 31(12R): 4048-4050.
[9] 张伟杰, 陈佳. 涂基层结合力性能测试及应用[J]. 襄阳职业技术学院学报, 2016, 15(2): 37-40.
[10] 王新征. 磁控溅射薄膜的过渡层与高速钢及镁基体结合强度的研究[D]. 西安: 西安理工大学, 2008.
[11] 程立军. 磁控溅射制备(Ti,Al)N基超硬质薄膜及其性能研究[D]. 天津: 河北工业大学, 2007.
[12] 任屏源. 卫星天线用碳纤维增强复合材料表面金属化研究[D]. 兰州: 兰州大学, 2007.
[13] 李文明, 张丽芳, 刘金玲, 等.用磁控溅射法制作电磁波屏蔽复合材料[J]. 吉林大学自然科学学报, 1996(3): 65-66.
[14] 汪金铭. C/C复合材料表面磁控溅射ZrN薄膜[J]. 湖北农机化, 2020(4): 173.
[15] 张欣宇, 王时礼, 钟喜春, 等. 金属镀层厚度测量结果的一致性研究[J]. 计量与测试技术, 2014, 41(4): 1-3.
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