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VACUUM ›› 2022, Vol. 59 ›› Issue (3): 46-51.doi: 10.13385/j.cnki.vacuum.2022.03.10

• Thin Film • Previous Articles     Next Articles

Double Ion Beam Sputtering ITO Thin Film and Its Application in Electromagnetic Shielding Windows

WANG Song-lin, YANG Chong-min, ZHANG Jian-fu, LI Ming-wei, MI Gao-yuan, ZHAO Hong-jun, JIA Xue-tao   

  1. Xi′an Institute of Applied Optics, Xi′an 710065, China
  • Received:2021-05-29 Online:2022-05-25 Published:2022-06-01

Abstract: To study the application of ITO films in the 1064nm laser window of wide magnetic shielding, ITO thin films were prepared by using dual ion beam sputtering technology under different technological conditions. According to the test results of photoelectric properties of the films,the effects of oxygen flow rate, auxiliary ion source and substrate baking temperature on the transmittance and conductivity of ITO films were analyzed. Using Ti2O3 and SiO2 as high and low refractive index materials and ITO film as electromagnetic shielding film on K9 glass substrate, a 1064nm laser window film with 0°-45° incidence was designed and fabricated for 2-18GHz efficient shielding. The test results show that the thin film prepared under suitable technological conditions has good transmittance and electromagnetic shielding performance, and is suitable as a high-efficient electromagnetic shielding,0°-45° incident of 1064nm laser window film.

Key words: double ion beam sputtering, ITO film, electromagnetic shielding, wide angle incidence, laser window

CLC Number: 

  • TB43
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