掺氮碳膜的制备及其应用研究进展*

doi:10.13385/j.cnki.vacuum.2026.02.01

摘要/Abstract

摘要： 掺氮碳膜是指通过化学或物理方法将氮原子引入碳基质中形成的功能化薄膜材料,具有优异的机械性能、化学稳定性和功能可调性。常用的制备方法包括化学气相沉积（CVD）、物理气相沉积（PVD）和热解合成法。应用研究表明,掺氮碳膜在表面防腐领域可有效阻隔腐蚀介质渗透,使金属衬底腐蚀电流密度降低1~2个数量级;在能源存储与转换中作为电极材料可提供高比电容和强循环稳定性;在电子器件方面,其高导电性、高透明度和可弯曲性为柔性电子发展提供新途径。

关键词: 掺氮碳膜, 化学气相沉积, 物理气相沉积, 热解合成法

Abstract: Nitrogen-doped carbon films (NCFs) are functionalized thin-film materials grown by introducing nitrogen atoms into a carbon matrix through chemical or physical methods. These films exhibit excellent mechanical properties, chemical stability and tunable functionality. The most common synthesis approaches for the preparation of NCFs include chemical vapor deposition, physical vapor deposition and pyrolytic synthesis. Application studies demonstrate that NCFs significantly enhance surface anti-corrosion performance by effectively blocking the penetration of corrosive media, and reduce the corrosion current density of metal substrates by 1-2 orders of magnitude. In energy storage and conversion systems, NCFs serve as high-performance electrode materials, delivering elevated specific capacitance and robust cycling stability. For electronic devices, their high conductivity, transparency and flexibility offer novel pathways for advancing flexible electronics.

Key words: nitrogen-doped carbon film, chemical vapor deposition, physical vapor deposition, pyrolytic synthesis

中图分类号: TB383

严建军, 方弘历, 苑超伟, 綦学洋, 王正铎, 刘忠伟. 掺氮碳膜的制备及其应用研究进展^*[J]. 真空, 2026, 63(2): 1-12.

YAN Jianjun, FANG Hongli, YUAN Chaowei, QI Xueyang, WANG Zhengduo, LIU Zhongwei. Research Progress on the Preparation and Application of Nitrogen-Doped Carbon Films[J]. VACUUM, 2026, 63(2): 1-12.

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