真空 ›› 2020, Vol. 57 ›› Issue (3): 17-20.doi: 10.13385/j.cnki.vacuum.2020.03.04
张庆芳1,2, 易勇1, 罗江山2
ZHANG Qing-fang1,2, YI Yong1, LUO Jiang-shan2
摘要: 采用直流磁控溅射方法制备出铒(Er)薄膜,利用X射线衍射仪(XRD)和扫描电子显微镜(SEM)研究了溅射功率对Er薄膜微观结构的影响。结果表明:在溅射功率20W~60W的范围内,Er薄膜均为hcp结构,且呈现明显的(110)晶面择优取向的微观织构。Er薄膜生长呈现柱状晶模式,随着溅射功率的增加,柱状晶组织相应长大,薄膜结构更加致密,表面更为平整,其平均晶粒尺寸7.7nm~9.6nm,表面粗糙度最低2.1nm。磁控溅射方法制备的Er薄膜与电子束蒸发等方法制备的Er薄膜相比具有不同的微观结构特征。
中图分类号:
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