用于氧化锆模拟种植体表面亲水改性的新型等离子体处理系统*

doi:10.13385/j.cnki.vacuum.2025.03.11

真空 ›› 2025, Vol. 62 ›› Issue (3): 58-64.doi: 10.13385/j.cnki.vacuum.2025.03.11

用于氧化锆模拟种植体表面亲水改性的新型等离子体处理系统^*

蔡嘉宁¹, 余德平¹, 巩晓菲², 薛嘉清¹, 张佳诚¹, 郑铮², 陈文川^2,3

1.四川大学机械工程学院,四川成都 610065;
2.口腔疾病防治全国重点实验室国家口腔医学中心国家口腔疾病临床医学研究中心四川大学华西口腔医院修复Ⅰ科,四川成都 610041;
3.四川大学华西口腔医院锦江门诊部,四川成都 610041

收稿日期:2024-12-15 出版日期:2025-05-25 发布日期:2025-05-23
通讯作者: 余德平,教授;陈文川,教授。
作者简介:蔡嘉宁（2000-）,男,甘肃兰州人,硕士研究生。
基金资助:
*国家自然科学基金面上项目（82471023）; 中国博士后科学基金面上资助（2024M752272）; 四川省重点研发项目（2024YFFK0292）; 四川省自然科学基金项目青年基金（2025ZNSFSC1593）; 成都市科技项目重点研发支撑计划（2024-YF05-00979-SN）; 四川大学青岛研究院“8122计划”创新创业团队项目（21GZ30601）

A Novel Plasma Treatment System for Simulating Hydrophilic Modification of Zirconia Implant Surfaces

CAI Jianing¹, YU Deping¹, GONG Xiaofei², XUE Jiaqing¹, ZHANG Jiacheng¹, ZHENG Zheng², CHEN Wenchuan^2,3

1. School of Mechanical Engineering, Sichuan University, Chengdu 610065, China;
2. State Key Laboratory of Oral Diseases & National Center for Stomatology & National Clinical Research Center for Oral Diseases & Department of Oral Prosthodontics, West China Hospital of Stomatology, Sichuan University, Chengdu 610041, China;
3. Jinjiang Out-patient Section, West China Hospital of Stomatology, Sichuan University, Chengdu 610041, China

Received:2024-12-15 Online:2025-05-25 Published:2025-05-23

摘要/Abstract

摘要： 氧化锆种植体因其优异的生物学及美学性能,在种植牙手术中应用愈发广泛。为进一步提升氧化锆种植体的骨结合率与种植成功率,提出了一种用于氧化锆模拟种植体复杂形状表面亲水改性的等离子体处理系统。该系统利用纳米银线制备作为同轴介质阻挡放电的外透明电极,将氧化锆种植体置于低压腔内轴电极上方,可在处理1 min后显著提升种植体表面亲水性。通过实验验证了系统可靠性与处理的有效性,并确定了系统最优处理参数,处理时间约60 s、绝对气压低于3 kPa、电源输出电压为7 kV时,氧化锆种植体亲水性最佳。

关键词: 等离子体, 亲水改性, 种植体, 氧化锆

Abstract: Zirconia implants are increasingly being used in dental implant surgery owing to their excellent biological and aesthetic properties. To further improve the osseointegration and success rate of zirconia implants, a plasma treatment system for simulating hydrophilic modification of complex shaped zirconia implant surfaces was proposed. The system utilizes nano silver wires to prepare an external transparent electrode as the coaxial dielectric barrier for discharge. The zirconia implant is placed above the axis electrode in the low-voltage chamber, which can significantly improve the surface hydrophilicity of the implant after treatment within one minute. The reliability and effectiveness of the system were verified through experiments, and the optimal processing parameters were determined. When the implantation treatment time is about 60 s, the absolute air pressure is below 3 kPa, and the power output voltage is 7 kV, the zirconia implant shows the best hydrophilicity.

Key words: plasma, hydrophilic modification, implant, zirconia

中图分类号: TH787

蔡嘉宁, 余德平, 巩晓菲, 薛嘉清, 张佳诚, 郑铮, 陈文川. 用于氧化锆模拟种植体表面亲水改性的新型等离子体处理系统^*[J]. 真空, 2025, 62(3): 58-64.

CAI Jianing, YU Deping, GONG Xiaofei, XUE Jiaqing, ZHANG Jiacheng, ZHENG Zheng, CHEN Wenchuan. A Novel Plasma Treatment System for Simulating Hydrophilic Modification of Zirconia Implant Surfaces[J]. VACUUM, 2025, 62(3): 58-64.

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用于氧化锆模拟种植体表面亲水改性的新型等离子体处理系统^*

A Novel Plasma Treatment System for Simulating Hydrophilic Modification of Zirconia Implant Surfaces

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