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真空 ›› 2026, Vol. 63 ›› Issue (1): 15-21.doi: 10.13385/j.cnki.vacuum.2026.01.03

• 薄膜 • 上一篇    下一篇

不同制备方式对TiN涂层性能影响研究

俞磊, 田俊瑞, 曹磊, 曹志强   

  1. 北京北方华创真空技术有限公司,北京 100015
  • 收稿日期:2024-11-01 出版日期:2026-01-25 发布日期:2026-02-02
  • 作者简介:俞 磊(1997-),男,甘肃省兰州市人,硕士。

Study on the Influence of Various Preparation Methods on the Properties of TiN Coatings

YU Lei, TIAN Junrui, CAO Lei, CAO Zhiqiang   

  1. Beijing NAURA Vacuum Technology Co., Ltd., Beijing 100015, China
  • Received:2024-11-01 Online:2026-01-25 Published:2026-02-02

摘要: 物理气相沉积是一类清洁、高效的陶瓷涂层制备方法,其不同制备工艺对于膜层的结构及性能均有影响。本文使用高功率脉冲磁控溅射(HiPIMS)技术和自研的复合磁场电弧离子镀(AIP)技术分别制备TiN涂层,对比研究了膜层的微观形貌、力学性能、摩擦性能和电化学腐蚀行为。结果表明:HiPIMS所制备的膜层更为致密,纳米硬度达30.8 GPa;在相同测试条件下,HiPIMS制备膜层的极化电阻较AIP膜层高出一个数量级,耐蚀性更好;AIP制备的膜层表现出更高的弹性模量,为575.5 GPa,大气下摩擦因数最低为0.42。

关键词: 电弧离子镀, 高功率脉冲磁控溅射, 摩擦性能, 耐腐蚀性, 电化学

Abstract: Physical vapor deposition, as a clean and efficient coating method, is considered to be the best choice for preparing ceramic coatings. Different preparation methods influence the structure and performance of the film. In this paper, TiN coatings were prepared by high-power pulsed magnetron sputtering (HiPIMS) technology and self-developed composite magnetic field arc ion plating (AIP), and the microstructure, mechanical properties, friction performance, and electrochemical corrosion behavior of the coatings were studied. The results show that the coating prepared by HiPIMS is more denser and the nano-hardness is 30.8 GPa. The polarization resistance of the coating deposited by HiPIMS is about one order of magnitude higher than that of AIP film under the same test conditions. The AIP coating shows higher elastic modulus of 575.5 GPa, and the lowest friction coefficient of the coating under atmospheric conditions is 0.42.

Key words: AIP, HiPIMS, friction property, corrosion resistance, electrochemistry

中图分类号:  TB34

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