真空 ›› 2026, Vol. 63 ›› Issue (1): 15-21.doi: 10.13385/j.cnki.vacuum.2026.01.03
俞磊, 田俊瑞, 曹磊, 曹志强
YU Lei, TIAN Junrui, CAO Lei, CAO Zhiqiang
摘要: 物理气相沉积是一类清洁、高效的陶瓷涂层制备方法,其不同制备工艺对于膜层的结构及性能均有影响。本文使用高功率脉冲磁控溅射(HiPIMS)技术和自研的复合磁场电弧离子镀(AIP)技术分别制备TiN涂层,对比研究了膜层的微观形貌、力学性能、摩擦性能和电化学腐蚀行为。结果表明:HiPIMS所制备的膜层更为致密,纳米硬度达30.8 GPa;在相同测试条件下,HiPIMS制备膜层的极化电阻较AIP膜层高出一个数量级,耐蚀性更好;AIP制备的膜层表现出更高的弹性模量,为575.5 GPa,大气下摩擦因数最低为0.42。
中图分类号: TB34
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