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VACUUM ›› 2022, Vol. 59 ›› Issue (1): 29-32.doi: 10.13385/j.cnki.vacuum.2022.01.06

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Study on the Properties of Large-area ZnO Thin Films Fabricated by Magnetron Sputtering Deposition

LIU Yuan-dong   

  1. Beijing Institute Of Electronic Information,Beijing 100009,China
  • Received:2020-10-09 Online:2022-01-25 Published:2022-01-27

Abstract: ZnO thin films were deposited on glass substrate by magnetron sputtering ZnO ceramic targets. The phase structure, band gap, transmittance and microstructure of the films were investigated by X-ray diffraction,scanning electron microscope and multifunctional film tester. The results show that the ZnO films with(002)preferred orientation can be formed under different process parameters. The process parameters affect the transmittance of the films. The coverage of films is determined by the sputtering power.

Key words: magnetron sputtering, ZnO films, process parameters, transmittance

CLC Number: 

  • TB43
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