双离子束溅射ITO薄膜在电磁屏蔽窗口中的应用*

doi:10.13385/j.cnki.vacuum.2022.03.10

摘要/Abstract

摘要： 为了研究ITO薄膜在宽角度电磁屏蔽激光窗口中的应用效果,采用双离子束溅射镀膜技术在不同工艺条件下制备了ITO薄膜,根据薄膜的光电性能测试结果,分析了氧气流量、辅助离子源、基片烘烤温度等工艺条件对ITO薄膜透光性和导电性的影响。用Ti₂O₃和SiO₂作为高、低折射率材料,ITO薄膜作为电磁屏蔽膜层,在K9玻璃基片上设计了对2~18GHz电磁波高效屏蔽的0°~45°宽角度入射的1064nm激光窗口膜层,并利用双离子束溅射技术在合适的工艺条件下完成了薄膜的制备。测试结果显示,制备的薄膜透光性和电磁屏蔽性能良好,具有一定的耐酸性,适合作为高效电磁屏蔽、0°~45°宽角度入射的1064nm激光窗口膜层。

关键词: 双离子束溅射, ITO薄膜, 电磁屏蔽, 宽角度入射, 激光窗口

Abstract: To study the application of ITO films in the 1064nm laser window of wide magnetic shielding, ITO thin films were prepared by using dual ion beam sputtering technology under different technological conditions. According to the test results of photoelectric properties of the films,the effects of oxygen flow rate, auxiliary ion source and substrate baking temperature on the transmittance and conductivity of ITO films were analyzed. Using Ti₂O₃ and SiO₂ as high and low refractive index materials and ITO film as electromagnetic shielding film on K9 glass substrate, a 1064nm laser window film with 0°-45° incidence was designed and fabricated for 2-18GHz efficient shielding. The test results show that the thin film prepared under suitable technological conditions has good transmittance and electromagnetic shielding performance, and is suitable as a high-efficient electromagnetic shielding,0°-45° incident of 1064nm laser window film.

Key words: double ion beam sputtering, ITO film, electromagnetic shielding, wide angle incidence, laser window

中图分类号:

TB43

王松林, 杨崇民, 张建付, 李明伟, 米高园, 赵红军, 贾雪涛. 双离子束溅射ITO薄膜在电磁屏蔽窗口中的应用^*[J]. 真空, 2022, 59(3): 46-51.

WANG Song-lin, YANG Chong-min, ZHANG Jian-fu, LI Ming-wei, MI Gao-yuan, ZHAO Hong-jun, JIA Xue-tao. Double Ion Beam Sputtering ITO Thin Film and Its Application in Electromagnetic Shielding Windows[J]. VACUUM, 2022, 59(3): 46-51.

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