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Study on fabrication and properties of micro-nano structure AZO films by DC
coupled RF sputtering
YAO Ting-ting, ZHONG Zhao-jin, LI Gang, TANG Yong-kang, YANG Yong, JIN Ke-wu, SHENG Hong-xue, WANG Tian-qi, PENG Saiao, JIN Liang-mao, SHEN Hong-lie, GAN Zhi-ping, MA Li-yun
VACUUM
2018, 55 (6):
64-67.
DOI: 10.13385/j.cnki.vacuum.2018.06.14
Micro -nano structured Al -doped ZnO thin films were deposited by DC -RF coupled magnetron sputtering system binding winding bar scraping coating on glass substrates at room temperature. The RF sputtering power ratio of basement AZO film was adjusted from 50% to 90% . The structure, surface morphology, optical and electrical properties of the micro -nano structured AZO films were investigated by X-ray diffractometer, scanning electronic microscope, Hall effect test system, ultravioletvisible spectrophotometer and WGW, respectively. The results indicate that the resistivity of the micro-nano structured AZO film is dominated by RF sputtering power ratio of the basement AZO film. The films deposited under RF sputtering power ratio of 80% exhibit the lowest resistivity of 5.32×10-4 Ω·cm. The average optical haze is approximately 36.3% in the visible wavelength. With the increase of RF sputtering power ratio, the surface morphology, growth form and the particle size of the films change greatly. Meanwhile, the micro-nano structured AZO films show light trapping effect and excellent optical and electrical properties.
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